Inventor
MATSUYAMA YUJI
JP45 patents
⚠️ This page may combine multiple inventors who share the name “MATSUYAMA YUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
38 patentsUS6074154AJun 13, 2000
Substrate treatment system, substrate transfer system, and substrate transfer method
TOKYO ELECTRON LTD457 citations99
US6514570B1Feb 4, 2003
Solution processing apparatus and method
TOKYO ELECTRON LTD90 citations98
US6672779B2Jan 6, 2004
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD51 citations96
US6471422B2Oct 29, 2002
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD63 citations96
US6425722B1Jul 30, 2002
Substrate treatment system, substrate transfer system, and substrate transfer method
TOKYO ELECTRON LTD54 citations96
US6402401B1Jun 11, 2002
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD49 citations96
US5374312ADec 20, 1994
Liquid coating system
TOKYO ELECTRON LTD119 citations96
US6632281B2Oct 14, 2003
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD15 citations93
US6633022B2Oct 14, 2003
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD21 citations93
US6585430B2Jul 1, 2003
System and method for coating and developing
TOKYO ELECTRON LTD42 citations93
US6518199B2Feb 11, 2003
Method and system for coating and developing
TOKYO ELECTRON LTD31 citations93
US6402821B1Jun 11, 2002
Filter unit and solution treatment unit
TOKYO ELECTRON LTD38 citations93
US6292250B1Sep 18, 2001
Substrate process apparatus
TOKYO ELECTRON LTD25 citations93
US6287025B1Sep 11, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD26 citations93
US6246030B1Jun 12, 2001
Heat processing method and apparatus
TOKYO ELECTRON LTD35 citations93
US6215545B1Apr 10, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD23 citations93
US6602382B1Aug 5, 2003
Solution processing apparatus
TOKYO ELECTRON LTD49 citations92
US6533864B1Mar 18, 2003
Solution processing apparatus and method
TOKYO ELECTRON LTD53 citations92
US6384894B2May 7, 2002
Developing method and developing unit
TOKYO ELECTRON LTD36 citations92
US6364547B1Apr 2, 2002
Solution processing apparatus
TOKYO ELECTRON LTD38 citations92
US6261365B1Jul 17, 2001
Heat treatment method, heat treatment apparatus and treatment system
TOKYO ELECTRON LTD19 citations92
US6015066AJan 18, 2000
Liquid supplying device
TOKYO ELECTRON LTD44 citations92
US6332723B1Dec 25, 2001
Substrate processing apparatus and method
TOKYO ELECTRON LTD51 citations91
US5035200AJul 30, 1991
Processing liquid supply unit
TOKYO ELECTRON LTD51 citations91
US6875281B2Apr 5, 2005
Method and system for coating and developing
TOKYO ELECTRON LTD12 citations84
US6655891B2Dec 2, 2003
Substrate treatment system, substrate transfer system, and substrate transfer method
TOKYO ELECTRON LTD13 citations84
US6485893B1Nov 26, 2002
Resist pattern forming method and film forming method
TOKYO ELECTRON LTD16 citations84
US6467976B2Oct 22, 2002
Coating and developing system
TOKYO ELECTRON LTD18 citations84
US6312171B1Nov 6, 2001
Developing apparatus and method thereof
TOKYO ELECTRON LTD16 citations83
US5958145ASep 28, 1999
Method for washing both surfaces of a substrate
TOKYO ELECTRON LTD16 citations82
US6884298B2Apr 26, 2005
Method and system for coating and developing
TOKYO ELECTRON LTD6 citations74
US6224274B1May 1, 2001
Semiconductor processing apparatus
TOKYO ELECTRON LTD7 citations74
US6173468B1Jan 16, 2001
Apparatus for washing both surfaces of a substrate
TOKYO ELECTRON LTD14 citations74
US5985039ANov 16, 1999
Apparatus and method for washing both surfaces of a substrate
TOKYO ELECTRON LTD15 citations74
US7022190B2Apr 4, 2006
Substrate coating unit and substrate coating method
TOKYO ELECTRON LTD6 citations63
US6979474B2Dec 27, 2005
Heat treatment method, heat treatment apparatus and treatment system
TOKYO ELECTRON LTD4 citations62
US7517217B2Apr 14, 2009
Method and apparatus for heat processing of substrate
TOKYO ELECTRON LTD2 citations61
US6969538B2Nov 29, 2005
Method for heat processing of substrate
TOKYO ELECTRON LTD1 citations50