Inventor
OKOSHI ATSUSHI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “OKOSHI ATSUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI GAS CHEMICAL CO
14 patentsUS7323522B2Jan 29, 2008
Cyclohexanetricarboxylic monoester and its use
MITSUBISHI GAS CHEMICAL CO9 citations82
US7071362B2Jul 4, 2006
Process for producing alicyclic aldehydes
MITSUBISHI GAS CHEMICAL CO11 citations82
US7569708B2Aug 4, 2009
Liquid cyclohexane-tricarboxylic acid anhydride
MITSUBISHI GAS CHEMICAL CO7 citations72
US6458994B2Oct 1, 2002
Process for producing aromatic polycarboxylic acid
MITSUBISHI GAS CHEMICAL CO7 citations71
US8034962B2Oct 11, 2011
Acid anhydride ester and composition thereof, and heat-curable resin composition and cured product thereof
MITSUBISHI GAS CHEMICAL CO2 citations62
US6579990B2Jun 17, 2003
Process for producing refined pyromellitic acid and refined pyromellitic anhydride
MITSUBISHI GAS CHEMICAL CO2 citations60
US6888023B2May 3, 2005
Process for producing pyromellitic acid
MITSUBISHI GAS CHEMICAL CO2 citations58
US6472540B1Oct 29, 2002
Process for producing ε-caprolactone
MITSUBISHI GAS CHEMICAL CO0 citations52
US5994565ANov 30, 1999
Process for producing purified ε-caprolactone
MITSUBISHI GAS CHEMICAL CO1 citations52
US9725551B2Aug 8, 2017
Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and method for producing these
MITSUBISHI GAS CHEMICAL CO0 citations50
US9562130B2Feb 7, 2017
Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and methods for producing these
MITSUBISHI GAS CHEMICAL CO0 citations50
US7569707B2Aug 4, 2009
Production method of highly pure pyromellitic dianhydride
MITSUBISHI GAS CHEMICAL CO1 citations50
US10359701B2Jul 23, 2019
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
MITSUBISHI GAS CHEMICAL CO0 citations39
US10338471B2Jul 2, 2019
Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
MITSUBISHI GAS CHEMICAL CO0 citations39