Inventor

SEBALD MICHAEL

DE48 patents

⚠️ This page may combine multiple inventors who share the name “SEBALD MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SEBALD MICHAEL

INFINEON TECHNOLOGIES AG

Process for sidewall amplification of resist structures and for the production of structures having reduced structure size

Method for producing resist structures

Bottom resist

Negative resist process with simultaneous development and silylation

Method for structuring a photoresist layer

Photoresist compound and method for structuring a photoresist layer

Process for structuring a photoresist layer

Method of structuring a photoresist layer

Process for structuring a photoresist layer

Method for structuring a photoresist layer

Silicon-containing resist for photolithography

Negative resist process with simultaneous development and aromatization of resist structures

Chemically amplified photoresist and process for structuring substituents using transparency enhancement of resist copolymers for 157 nm photolithography through the use of fluorinated cinnamic acid derivatives

Method for experimentally verifying imaging errors in photomasks

Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers

Method for experimentally verifying imaging errors in optical exposure units

Apparatus and method for proof of outgassing products

Resist for photolithography having reactive groups for subsequent modification of the resist structures

Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography

Method for structuring a photoresist layer

Resist for electron beam lithography and a process for producing photomasks using electron beam lithography

Lithographic process for reducing the lateral chromium structure loss in photomask production using chemically amplified resists

Process for silylating photoresists in the UV range

Silicon resist for photolithography at short exposure wavelengths and process for making photoresists

Process for modifying resist structures and resist films from the aqueous phase

SIEMENS AG

Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development

Photostructuring process

Etch-resistant deep ultraviolet resist process having an aromatic treating step after development

Photostructuring method

Radiation-sensitive mixture and its use

Process for producing a diffusion region adjacent to a recess in a substrate

Method for the production of a bottom resist

Method for the production of a bottom resist

Mixed polymers

Production of photolithographic structures

Method for producing a resist structure

Method for producing a resist structure

Film-forming polymers

Photosensitive composition

Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance

Radiation-sensitive resist composition comprising a diazoketone

Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water

Copolymers

Dry-developable positive resist

Process for producing n-tertiary butoxycarbonyl-maleinimide

SIEMENS AKTINEGESELLSCHAFT

Photoresists which are suitable for producing sub-micron size structures

INFINEONTECHNOLOGIES AG

Process for producing hard masks

QIMONDA AG

Method for structuring a substrate using a metal mask layer formed using a galvanization process