Inventor

SMALL ROBERT J

US45 patents

⚠️ This page may combine multiple inventors who share the name “SMALL ROBERT J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SMALL ROBERT J

EKC TECHNOLOGY INC

Post clean treatment

Post clean treatment composition comprising an organic acid and hydroxylamine

Post clean treatment

Method of removing etching residue

Chemical mechanical polishing composition and process

Compositions for cleaning organic and plasma etched residues for semiconductors devices

Lactam compositions for cleaning organic and plasma etched residues for semiconductor devices

Chemical mechanical polishing composition and process

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

Chemical mechanical polishing composition and process

Sulfoxide pyrolid(in)one alkanolamine cleaner composition

Compositions for cleaning organic and plasma etched residues for semiconductor devices

Composition for cleaning chemical mechanical planarization apparatus

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

Compositions for cleaning organic and plasma etched residues for semiconductor devices

Compositions and methods for rapidly removing overfilled substrates

Compositions for chemical mechanical planarization of tantalum and tantalum nitride

Chemical-mechanical planarization using ozone

Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials

Clean room wipes for neutralizing caustic chemicals

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

Compositions for chemical mechanical planarization of copper

Methods for chemically treating a substrate using foam technology

Composition for cleaning chemical mechanical planarization apparatus

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

DUPONT AIR PROD NANOMATERIALS

Catalyst attached to solid and used to promote free radical formation in CMP formulations

Free radical-forming activator attached to solid and used to enhance CMP formulations

Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same

Particulate or particle-bound chelating agents

CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers

Free radical-forming activator attached to solid and used to enhance CMP formulations

Periodic acid compositions for polishing ruthenium/low K substrates

Chemical mechanical polishing composition and process

Chemical mechanical polishing composition and process

Compositions of chemical mechanical planarization slurries contacting noble-metal-featured substrates

SMALL ROBERT J

Cerium oxide abrasives for chemical mechanical polishing

Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods

EKC TECHNOLOGIES INC

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

ADVANCED PROCESS TECHNOLOGIES LLC

Semiconductor cleaning using superacids

DUPONT AIRPRODUCTS NANOMATERIA

Chemical mechanical polishing composition and process

DA NANOMATERIALS L L C

Composition for chemical-mechanical polishing and method of using same

WESLEY II LIMITED PARTNERSHIP

Tetralin oxidation

CHELLE PHILIPPE H

Compositions and methods for rapidly removing overfilled substrates

ASHLAND OIL INC

Process for the reductive methylation of an acid hydrazide

DANANOMATERIALS LLC

Compositions for chemical mechanical planarization of tantalum and tantalum nitride