P

Inventor

GREENBERG DAVID R

US22 patents
⚠️ This page may combine multiple inventors who share the name “GREENBERG DAVID R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

17 patents
US6787427B2Sep 7, 2004

Method to fabricate SiGe HBTs with controlled current gain and improved breakdown voltage characteristics

IBM17 citations92
US6656809B2Dec 2, 2003

Method to fabricate SiGe HBTs with controlled current gain and improved breakdown voltage characteristics

IBM40 citations92
US6426265B1Jul 30, 2002

Incorporation of carbon in silicon/silicon germanium epitaxial layer to enhance yield for Si-Ge bipolar technology

IBM25 citations92
US7615457B2Nov 10, 2009

Method of fabricating self-aligned bipolar transistor having tapered collector

IBM9 citations84
US7425754B2Sep 16, 2008

Structure and method of self-aligned bipolar transistor having tapered collector

IBM13 citations84
US6836029B2Dec 28, 2004

Micro-electromechanical switch having a conductive compressible electrode

IBM18 citations84
US7767546B1Aug 3, 2010

Low cost fabrication of double box back gate silicon-on-insulator wafers with built-in shallow trench isolation in back gate layer

IBM12 citations83
US7075126B2Jul 11, 2006

Transistor structure with minimized parasitics and method of fabricating the same

IBM9 citations73
US6531720B2Mar 11, 2003

Dual sidewall spacer for a self-aligned extrinsic base in SiGe heterojunction bipolar transistors

IBM9 citations73
US6429500B1Aug 6, 2002

Semiconductor pin diode for high frequency applications

IBM11 citations73
US6815802B2Nov 9, 2004

Incorporation of carbon in silicon/silicon germanium epitaxial layer to enhance yield for Si-Ge bipolar technology

IBM5 citations71
US7713829B2May 11, 2010

Incorporation of carbon in silicon/silicon germanium epitaxial layer to enhance yield for Si-Ge bipolar technology

IBM1 citations62
US7642569B2Jan 5, 2010

Transistor structure with minimized parasitics and method of fabricating the same

IBM1 citations62
US7491617B2Feb 17, 2009

Transistor structure with minimized parasitics and method of fabricating the same

IBM2 citations62
US7253070B2Aug 7, 2007

Transistor structure with minimized parasitics and method of fabricating the same

IBM3 citations62
US7355221B2Apr 8, 2008

Field effect transistor having an asymmetrically stressed channel region

IBM3 citations61
US7173274B2Feb 6, 2007

Incorporation of carbon in silicon/silicon germanium epitaxial layer to enhance yield for Si-Ge bipolar technology

IBM0 citations51

DENNARD ROBERT H

2 patents

INTERNAT BUSINESS MACHINES CPORPORATION

1 patent

GREENBERG DAVID R

1 patent

INFORMATION BUSINESS MACHINES

1 patent