Inventor
BARR ALEXANDER L
FR20 patents
⚠️ This page may combine multiple inventors who share the name “BARR ALEXANDER L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FREESCALE SEMICONDUCTOR INC
19 patentsUS7226833B2Jun 5, 2007
Semiconductor device structure and method therefor
FREESCALE SEMICONDUCTOR INC124 citations99
US6838322B2Jan 4, 2005
Method for forming a double-gated semiconductor device
FREESCALE SEMICONDUCTOR INC259 citations98
US7282402B2Oct 16, 2007
Method of making a dual strained channel semiconductor device
FREESCALE SEMICONDUCTOR INC69 citations97
US7018901B1Mar 28, 2006
Method for forming a semiconductor device having a strained channel and a heterojunction source/drain
FREESCALE SEMICONDUCTOR INC105 citations97
US6831350B1Dec 14, 2004
Semiconductor structure with different lattice constant materials and method for forming the same
FREESCALE SEMICONDUCTOR INC89 citations97
US7037795B1May 2, 2006
Low RC product transistors in SOI semiconductor process
FREESCALE SEMICONDUCTOR INC26 citations93
US7208357B2Apr 24, 2007
Template layer formation
FREESCALE SEMICONDUCTOR INC18 citations92
US7067868B2Jun 27, 2006
Double gate device having a heterojunction source/drain and strained channel
FREESCALE SEMICONDUCTOR INC39 citations92
US7029980B2Apr 18, 2006
Method of manufacturing SOI template layer
FREESCALE SEMICONDUCTOR INC25 citations92
US7205210B2Apr 17, 2007
Semiconductor structure having strained semiconductor and method therefor
FREESCALE SEMICONDUCTOR INC16 citations84
US7163903B2Jan 16, 2007
Method for making a semiconductor structure using silicon germanium
FREESCALE SEMICONDUCTOR INC10 citations84
US7160769B2Jan 9, 2007
Channel orientation to enhance transistor performance
FREESCALE SEMICONDUCTOR INC10 citations84
US7045432B2May 16, 2006
Method for forming a semiconductor device with local semiconductor-on-insulator (SOI)
FREESCALE SEMICONDUCTOR INC14 citations84
US6964911B2Nov 15, 2005
Method for forming a semiconductor device having isolation regions
FREESCALE SEMICONDUCTOR INC10 citations74
US7056778B2Jun 6, 2006
Semiconductor layer formation
FREESCALE SEMICONDUCTOR INC7 citations72
US7781840B2Aug 24, 2010
Semiconductor device structure
FREESCALE SEMICONDUCTOR INC4 citations63
US7241647B2Jul 10, 2007
Graded semiconductor layer
FREESCALE SEMICONDUCTOR INC5 citations63
US7927956B2Apr 19, 2011
Method for making a semiconductor structure using silicon germanium
FREESCALE SEMICONDUCTOR INC0 citations52
US7811382B2Oct 12, 2010
Method for forming a semiconductor structure having a strained silicon layer
FREESCALE SEMICONDUCTOR INC1 citations52