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Inventor

SADAKA MARIAM G

US39 patents
⚠️ This page may combine multiple inventors who share the name “SADAKA MARIAM G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FREESCALE SEMICONDUCTOR INC

33 patents
US7226833B2Jun 5, 2007

Semiconductor device structure and method therefor

FREESCALE SEMICONDUCTOR INC124 citations99
US7575968B2Aug 18, 2009

Inverse slope isolation and dual surface orientation integration

FREESCALE SEMICONDUCTOR INC533 citations97
US7282402B2Oct 16, 2007

Method of making a dual strained channel semiconductor device

FREESCALE SEMICONDUCTOR INC69 citations97
US7018901B1Mar 28, 2006

Method for forming a semiconductor device having a strained channel and a heterojunction source/drain

FREESCALE SEMICONDUCTOR INC105 citations97
US6893947B2May 17, 2005

Advanced RF enhancement-mode FETs with improved gate properties

FREESCALE SEMICONDUCTOR INC124 citations97
US7575975B2Aug 18, 2009

Method for forming a planar and vertical semiconductor structure having a strained semiconductor layer

FREESCALE SEMICONDUCTOR INC34 citations93
US7524707B2Apr 28, 2009

Modified hybrid orientation technology

FREESCALE SEMICONDUCTOR INC19 citations93
US7037795B1May 2, 2006

Low RC product transistors in SOI semiconductor process

FREESCALE SEMICONDUCTOR INC26 citations93
US7435639B2Oct 14, 2008

Dual surface SOI by lateral epitaxial overgrowth

FREESCALE SEMICONDUCTOR INC34 citations92
US7208357B2Apr 24, 2007

Template layer formation

FREESCALE SEMICONDUCTOR INC18 citations92
US7067868B2Jun 27, 2006

Double gate device having a heterojunction source/drain and strained channel

FREESCALE SEMICONDUCTOR INC39 citations92
US7029980B2Apr 18, 2006

Method of manufacturing SOI template layer

FREESCALE SEMICONDUCTOR INC25 citations92
US7803670B2Sep 28, 2010

Twisted dual-substrate orientation (DSO) substrates

FREESCALE SEMICONDUCTOR INC19 citations84
US7205210B2Apr 17, 2007

Semiconductor structure having strained semiconductor and method therefor

FREESCALE SEMICONDUCTOR INC16 citations84
US7163903B2Jan 16, 2007

Method for making a semiconductor structure using silicon germanium

FREESCALE SEMICONDUCTOR INC10 citations84
US7160769B2Jan 9, 2007

Channel orientation to enhance transistor performance

FREESCALE SEMICONDUCTOR INC10 citations84
US7378306B2May 27, 2008

Selective silicon deposition for planarized dual surface orientation integration

FREESCALE SEMICONDUCTOR INC14 citations82
US7821067B2Oct 26, 2010

Electronic devices including a semiconductor layer

FREESCALE SEMICONDUCTOR INC11 citations81
US7265004B2Sep 4, 2007

Electronic devices including a semiconductor layer and a process for forming the same

FREESCALE SEMICONDUCTOR INC15 citations81
US6803248B2Oct 12, 2004

Chemistry for etching quaternary interface layers on InGaAsP mostly formed between GaAs and InxGa(1-x)P layers

FREESCALE SEMICONDUCTOR INC12 citations74
US7056778B2Jun 6, 2006

Semiconductor layer formation

FREESCALE SEMICONDUCTOR INC7 citations72
US7781840B2Aug 24, 2010

Semiconductor device structure

FREESCALE SEMICONDUCTOR INC4 citations63
US7615806B2Nov 10, 2009

Method for forming a semiconductor structure and structure thereof

FREESCALE SEMICONDUCTOR INC6 citations63
US7544548B2Jun 9, 2009

Trench liner for DSO integration

FREESCALE SEMICONDUCTOR INC6 citations63
US7402477B2Jul 22, 2008

Method of making a multiple crystal orientation semiconductor device

FREESCALE SEMICONDUCTOR INC4 citations63
US7241647B2Jul 10, 2007

Graded semiconductor layer

FREESCALE SEMICONDUCTOR INC5 citations63
US7754587B2Jul 13, 2010

Silicon deposition over dual surface orientation substrates to promote uniform polishing

FREESCALE SEMICONDUCTOR INC4 citations62
US7700420B2Apr 20, 2010

Integrated circuit with different channel materials for P and N channel transistors and method therefor

FREESCALE SEMICONDUCTOR INC3 citations62
US7927956B2Apr 19, 2011

Method for making a semiconductor structure using silicon germanium

FREESCALE SEMICONDUCTOR INC0 citations52
US7811382B2Oct 12, 2010

Method for forming a semiconductor structure having a strained silicon layer

FREESCALE SEMICONDUCTOR INC1 citations52
US6855965B2Feb 15, 2005

Method of manufacturing a semiconductor component and semiconductor component thereof

FREESCALE SEMICONDUCTOR INC0 citations52
US7419866B2Sep 2, 2008

Process of forming an electronic device including a semiconductor island over an insulating layer

FREESCALE SEMICONDUCTOR INC0 citations42
US7560318B2Jul 14, 2009

Process for forming an electronic device including semiconductor layers having different stresses

FREESCALE SEMICONDUCTOR INC0 citations41

MOTOROLA INC

3 patents

SADAKA MARIAM G

2 patents

ADETUTU OLUBUNMI O

1 patent