Inventor
O'DONNELL ROBERT J
US28 patents
⚠️ This page may combine multiple inventors who share the name “O'DONNELL ROBERT J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
24 patentsUS7300537B2Nov 27, 2007
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
LAM RES CORP64 citations98
US6537429B2Mar 25, 2003
Diamond coatings on reactor wall and method of manufacturing thereof
LAM RES CORP110 citations98
US7311797B2Dec 25, 2007
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
LAM RES CORP50 citations96
US6988326B2Jan 24, 2006
Phobic barrier meniscus separation and containment
LAM RES CORP59 citations96
US6954993B1Oct 18, 2005
Concentric proximity processing head
LAM RES CORP64 citations96
US6830622B2Dec 14, 2004
Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof
LAM RES CORP63 citations96
US6780787B2Aug 24, 2004
Low contamination components for semiconductor processing apparatus and methods for making components
LAM RES CORP53 citations96
US6620520B2Sep 16, 2003
Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
LAM RES CORP54 citations96
US6613442B2Sep 2, 2003
Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
LAM RES CORP49 citations96
US6533910B2Mar 18, 2003
Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
LAM RES CORP62 citations96
US5994235ANov 30, 1999
Methods for etching an aluminum-containing layer
LAM RES CORP51 citations96
US7363727B2Apr 29, 2008
Method for utilizing a meniscus in substrate processing
LAM RES CORP19 citations92
US7255898B2Aug 14, 2007
Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
LAM RES CORP29 citations92
US7093375B2Aug 22, 2006
Apparatus and method for utilizing a meniscus in substrate processing
LAM RES CORP37 citations92
US6773751B2Aug 10, 2004
Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
LAM RES CORP26 citations92
US7605086B2Oct 20, 2009
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
LAM RES CORP8 citations84
US6852636B1Feb 8, 2005
Insitu post etch process to remove remaining photoresist and residual sidewall passivation
LAM RES CORP14 citations84
US6475298B1Nov 5, 2002
Post-metal etch treatment to prevent corrosion
LAM RES CORP14 citations82
US6790242B2Sep 14, 2004
Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof
LAM RES CORP11 citations74
US7503977B1Mar 17, 2009
Solidifying layer for wafer cleaning
LAM RES CORP6 citations63
US7128804B2Oct 31, 2006
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
LAM RES CORP1 citations63
US6242107B1Jun 5, 2001
Methods for etching an aluminum-containing layer
LAM RES CORP3 citations63
US7270760B2Sep 18, 2007
Method and apparatus for simulating standard test wafers
LAM RES CORP0 citations50
US6296778B1Oct 2, 2001
Method and apparatus for simulating standard test wafers
LAM RES CORP1 citations50
O'DONNELL ROBERT J
3 patentsUS8318327B2Nov 27, 2012
Low contamination components for semiconductor processing apparatus and methods for making components
O'DONNELL ROBERT J363 citations98
US8486841B2Jul 16, 2013
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
O'DONNELL ROBERT J1 citations61
US8935990B2Jan 20, 2015
Low contamination components for semiconductor processing apparatus and methods for making components
O'DONNELL ROBERT J0 citations51