Inventor
HAN SANG-IN
US23 patents
⚠️ This page may combine multiple inventors who share the name “HAN SANG-IN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOLMAR KOREA CO LTD
9 patentsUSD1019386SMar 26, 2024
Spout for packaging container
KOLMAR KOREA CO LTD4 citations74
USD1008799SDec 26, 2023
Spout for packaging container
KOLMAR KOREA CO LTD3 citations72
US11827437B2Nov 28, 2023
Container
KOLMAR KOREA CO LTD2 citations72
USD974182SJan 3, 2023
Packaging pouch
KOLMAR KOREA CO LTD2 citations71
USD993041SJul 25, 2023
Packaging container
KOLMAR KOREA CO LTD1 citations62
USD988876SJun 13, 2023
Packaging container
KOLMAR KOREA CO LTD1 citations62
USD1119564SMar 24, 2026
Container
KOLMAR KOREA CO LTD0 citations60
USD1119563SMar 24, 2026
Container
KOLMAR KOREA CO LTD0 citations60
USD1120759SMar 31, 2026
Packaging container
KOLMAR KOREA CO LTD0 citations56
FREESCALE SEMICONDUCTOR INC
5 patentsUS7282307B2Oct 16, 2007
Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same
FREESCALE SEMICONDUCTOR INC23 citations92
US6960509B1Nov 1, 2005
Method of fabricating three dimensional gate structure using oxygen diffusion
FREESCALE SEMICONDUCTOR INC28 citations92
US6811936B2Nov 2, 2004
Structure and process for a pellicle membrane for 157 nanometer lithography
FREESCALE SEMICONDUCTOR INC20 citations92
US6986971B2Jan 17, 2006
Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same
FREESCALE SEMICONDUCTOR INC23 citations90
US6986974B2Jan 17, 2006
Attenuated phase shift mask for extreme ultraviolet lithography and method therefore
FREESCALE SEMICONDUCTOR INC11 citations83
MOTOROLA INC
3 patentsUS6653053B2Nov 25, 2003
Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask
MOTOROLA INC21 citations92
US6477898B1Nov 12, 2002
Membrane mask stress measurement apparatus and method therefor
MOTOROLA INC22 citations92
US6673520B2Jan 6, 2004
Method of making an integrated circuit using a reflective mask
MOTOROLA INC15 citations83