Inventor
DE BOEIJ WILHELMUS PETRUS
NL20 patents
⚠️ This page may combine multiple inventors who share the name “DE BOEIJ WILHELMUS PETRUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
16 patentsUS6650399B2Nov 18, 2003
Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations
ASML NETHERLANDS BV172 citations97
US7345740B2Mar 18, 2008
Polarized radiation in lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV65 citations96
US7245353B2Jul 17, 2007
Lithographic apparatus, device manufacturing method
ASML NETHERLANDS BV38 citations91
US7245355B2Jul 17, 2007
Lithographic apparatus, device manufacturing method
ASML NETHERLANDS BV35 citations91
US7375799B2May 20, 2008
Lithographic apparatus
ASML NETHERLANDS BV24 citations89
US9989864B2Jun 5, 2018
Lithographic method and apparatus
ASML NETHERLANDS BV8 citations84
US7317512B2Jan 8, 2008
Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV8 citations74
US7535644B2May 19, 2009
Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV3 citations63
US7312852B2Dec 25, 2007
Polarized radiation in lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV5 citations62
US6906787B2Jun 14, 2005
Lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV4 citations57
US8351022B2Jan 8, 2013
Radiation beam modification apparatus and method
ASML NETHERLANDS BV1 citations52
US10001709B2Jun 19, 2018
Lithographic apparatus, spectral purity filter and device manufacturing method
ASML NETHERLANDS BV0 citations51
US7929116B2Apr 19, 2011
Polarized radiation in lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations51
US7889316B2Feb 15, 2011
Method for patterning a radiation beam, patterning device for patterning a radiation beam
ASML NETHERLANDS BV0 citations50
US9170498B2Oct 27, 2015
Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensor
ASML NETHERLANDS BV0 citations49
US10088756B2Oct 2, 2018
Lithographic apparatus and method
ASML NETHERLANDS BV0 citations36
BANINE VADIM YEVGENYEVICH
2 patentsUS9097982B2Aug 4, 2015
Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter
BANINE VADIM YEVGENYEVICH0 citations51
US9594306B2Mar 14, 2017
Lithographic apparatus, spectral purity filter and device manufacturing method
BANINE VADIM YEVGENYEVICH0 citations49