Inventor
NASSER-GHODSI MEHRAN
US45 patents
⚠️ This page may combine multiple inventors who share the name “NASSER-GHODSI MEHRAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR TECH CORP
18 patentsUS6810105B2Oct 26, 2004
Methods and apparatus for dishing and erosion characterization
KLA TENCOR TECH CORP53 citations91
US7838833B1Nov 23, 2010
Apparatus and method for e-beam dark imaging with perspective control
KLA TENCOR TECH CORP29 citations89
US6943350B2Sep 13, 2005
Methods and apparatus for electron beam inspection of samples
KLA TENCOR TECH CORP29 citations89
US6677586B1Jan 13, 2004
Methods and apparatus for electron beam inspection of samples
KLA TENCOR TECH CORP20 citations89
US7598492B1Oct 6, 2009
Charged particle microscopy using super resolution
KLA TENCOR TECH CORP26 citations87
US7148073B1Dec 12, 2006
Methods and systems for preparing a copper containing substrate for analysis
KLA TENCOR TECH CORP24 citations87
US7372016B1May 13, 2008
Calibration standard for a dual beam (FIB/SEM) machine
KLA TENCOR TECH CORP14 citations84
US7828622B1Nov 9, 2010
Sharpening metal carbide emitters
KLA TENCOR TECH CORP12 citations83
US7078689B1Jul 18, 2006
Integrated electron beam and contaminant removal system
KLA TENCOR TECH CORP7 citations74
US6801596B2Oct 5, 2004
Methods and apparatus for void characterization
KLA TENCOR TECH CORP10 citations68
US7945086B2May 17, 2011
Tungsten plug deposition quality evaluation method by EBACE technology
KLA TENCOR TECH CORP2 citations63
US7576317B1Aug 18, 2009
Calibration standard for a dual beam (FIB/SEM) machine
KLA TENCOR TECH CORP4 citations63
US8008207B2Aug 30, 2011
Use of ion implantation in chemical etching
KLA TENCOR TECH CORP3 citations62
US7855362B1Dec 21, 2010
Contamination pinning for auger analysis
KLA TENCOR TECH CORP6 citations61
US7365321B2Apr 29, 2008
Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
KLA TENCOR TECH CORP4 citations60
US6664541B2Dec 16, 2003
Methods and apparatus for defect localization
KLA TENCOR TECH CORP3 citations54
US7440086B2Oct 21, 2008
Methods and systems for creating a recipe for a defect review process
KLA TENCOR TECH CORP5 citations51
US7394339B1Jul 1, 2008
Transverse magnetic field voltage isolator
KLA TENCOR TECH CORP1 citations45
KLA TENCOR CORP
9 patentsUS8953869B2Feb 10, 2015
Apparatus and methods for inspecting extreme ultra violet reticles
KLA TENCOR CORP13 citations84
US9591770B2Mar 7, 2017
Multi-layer ceramic vacuum to atmosphere electric feed through
KLA TENCOR CORP5 citations72
US7635842B2Dec 22, 2009
Method and instrument for chemical defect characterization in high vacuum
KLA TENCOR CORP6 citations72
US9513230B2Dec 6, 2016
Apparatus and method for optical inspection, magnetic field and height mapping
KLA TENCOR CORP3 citations71
US10354832B2Jul 16, 2019
Multi-column scanning electron microscopy system
KLA TENCOR CORP3 citations69
US9793089B2Oct 17, 2017
Electron emitter device with integrated multi-pole electrode structure
KLA TENCOR CORP2 citations68
US9418819B2Aug 16, 2016
Asymmetrical detector design and methodology
KLA TENCOR CORP2 citations61
US7755042B1Jul 13, 2010
Auger electron spectrometer with applied magnetic field at target surface
KLA TENCOR CORP2 citations60
US9679372B2Jun 13, 2017
Apparatus and methods for inspecting extreme ultra violet reticles
KLA TENCOR CORP0 citations52
NASSER-GHODSI MEHRAN
6 patentsUS8513619B1Aug 20, 2013
Non-planar extractor structure for electron source
NASSER-GHODSI MEHRAN20 citations89
US8633457B2Jan 21, 2014
Background reduction system including louver
NASSER-GHODSI MEHRAN4 citations72
US8765496B2Jul 1, 2014
Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
NASSER-GHODSI MEHRAN4 citations69
US8530867B1Sep 10, 2013
Electron generation and delivery system for contamination sensitive emitters
NASSER-GHODSI MEHRAN2 citations62
US8188451B1May 29, 2012
Electron generation and delivery system for contamination sensitive emitters
NASSER-GHODSI MEHRAN5 citations62
US8202440B1Jun 19, 2012
Methods and apparatus for electron beam assisted etching at low temperatures
NASSER-GHODSI MEHRAN2 citations54