Inventor
KODAMA KENICHI
JP50 patents
⚠️ This page may combine multiple inventors who share the name “KODAMA KENICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
22 patentsUS7372449B2May 13, 2008
Display device, image display device and display method
FUJIFILM CORP26 citations92
US7499201B2Mar 3, 2009
Image reading apparatus, method of reading image, and image reading system
FUJIFILM CORP11 citations84
US7495633B2Feb 24, 2009
Image display apparatus, image display system, image data writing method, thin display file, and data communication method for thin display file
FUJIFILM CORP13 citations84
US7492945B2Feb 17, 2009
Electronic paper reading system
FUJIFILM CORP11 citations84
US7207648B2Apr 24, 2007
Inkjet head and method of cleaning inkjet head
FUJIFILM CORP11 citations84
US9201990B2Dec 1, 2015
Simulation method, simulation program, recording medium having the simulation program stored therein, method for producing droplet arrangement patterns utilizing the simulation method, nanoimprinting method, method for producing patterned substrates, and ink jet apparatus
FUJIFILM CORP11 citations82
US7559632B2Jul 14, 2009
Inkjet recording head and image forming apparatus comprising inkjet recording head
FUJIFILM CORP7 citations74
US9724916B2Aug 8, 2017
Ejection volume correction method for inkjet head, ejection volume correction apparatus
FUJIFILM CORP2 citations73
US7869654B2Jan 11, 2011
Electric paper reading system
FUJIFILM CORP5 citations73
US8851624B2Oct 7, 2014
Maintenance liquid
FUJIFILM CORP2 citations63
US7575306B2Aug 18, 2009
Discharge head, method of manufacturing discharge head, and liquid discharge apparatus
FUJIFILM CORP6 citations63
US7540595B2Jun 2, 2009
Liquid ejection head
FUJIFILM CORP3 citations63
US7325894B2Feb 5, 2008
Liquid droplet discharge head, liquid droplet discharge device, and image forming apparatus
FUJIFILM CORP4 citations63
US7204579B2Apr 17, 2007
Droplet discharging head and inkjet recording apparatus
FUJIFILM CORP6 citations63
US9028022B2May 12, 2015
Liquid ejection apparatus, nanoimprint system, and liquid ejection method
FUJIFILM CORP3 citations62
US8894187B2Nov 25, 2014
Liquid application device, liquid application method, and nanoimprint system
FUJIFILM CORP1 citations52
US7618129B2Nov 17, 2009
Liquid ejection head and image forming apparatus comprising same
FUJIFILM CORP0 citations52
US7604329B2Oct 20, 2009
Liquid ejection head and image forming apparatus
FUJIFILM CORP0 citations52
US7316465B2Jan 8, 2008
Liquid discharge apparatus and inkjet recording apparatus
FUJIFILM CORP0 citations52
US9862847B2Jan 9, 2018
Inkjet discharge method, pattern formation method, and pattern
FUJIFILM CORP1 citations51
US10016969B2Jul 10, 2018
Printing apparatus and printing method
FUJIFILM CORP0 citations42
US9481185B2Nov 1, 2016
Printing apparatus and printing method
FUJIFILM CORP0 citations42
FUJI PHOTO FILM CO LTD
15 patentsUS7070262B2Jul 4, 2006
Droplet ejecting head
FUJI PHOTO FILM CO LTD42 citations93
US7128404B2Oct 31, 2006
Droplet discharge head and inkjet recording apparatus
FUJI PHOTO FILM CO LTD29 citations92
US6480219B1Nov 12, 2002
Exposure head
FUJI PHOTO FILM CO LTD23 citations92
US6061371AMay 9, 2000
System for monitoring amount of light emitted from surface emitting laser
FUJI PHOTO FILM CO LTD18 citations92
US5905851AMay 18, 1999
Light beam scanning recording device
FUJI PHOTO FILM CO LTD25 citations92
US5822105AOct 13, 1998
Scanner
FUJI PHOTO FILM CO LTD29 citations86
US6433809B1Aug 13, 2002
Method of controlling light intensity in image exposure apparatus
FUJI PHOTO FILM CO LTD14 citations84
US7304620B2Dec 4, 2007
Image display apparatus and image display method
FUJI PHOTO FILM CO LTD8 citations74
US6696681B2Feb 24, 2004
F-θ lens, beam scanning device, and imaging apparatus
FUJI PHOTO FILM CO LTD11 citations74
US6590598B2Jul 8, 2003
Image forming apparatus
FUJI PHOTO FILM CO LTD8 citations74
US5751748AMay 12, 1998
System for monitoring amount of light emitted from surface emitting laser
FUJI PHOTO FILM CO LTD14 citations73
US5573894ANov 12, 1996
Method and apparatus for exposing photosensitive materials
FUJI PHOTO FILM CO LTD11 citations73
US6324005B1Nov 27, 2001
Focusing optical system
FUJI PHOTO FILM CO LTD4 citations63
US5995195ANov 30, 1999
Method and apparatus for exposing photosensitive materials
FUJI PHOTO FILM CO LTD5 citations62
US5646673AJul 8, 1997
Exposure device
FUJI PHOTO FILM CO LTD1 citations52
NIKON CORP
4 patentsUS7230680B2Jun 12, 2007
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method
NIKON CORP109 citations99
US9395516B2Jul 19, 2016
Imaging device
NIKON CORP55 citations96
US9307169B2Apr 5, 2016
Multiband camera, and multiband image capturing method
NIKON CORP11 citations84
US9625789B2Apr 18, 2017
Imaging device including a front optical system having a movable focusing lens group
NIKON CORP1 citations51
KODAMA KENICHI
4 patentsUS8827400B2Sep 9, 2014
Liquid application apparatus, liquid application method and imprinting system
KODAMA KENICHI2 citations61
US8908087B2Dec 9, 2014
Multiband camera, and multiband image capturing method
KODAMA KENICHI0 citations50
US8609006B2Dec 17, 2013
Pattern transfer apparatus and pattern forming method
KODAMA KENICHI1 citations50
US8212999B2Jul 3, 2012
Liquid droplet measurement apparatus and liquid droplet measurement method
KODAMA KENICHI0 citations39
TOSHIBA KK
2 patentsUS7474386B2Jan 6, 2009
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method
TOSHIBA KK14 citations92
US7365830B2Apr 29, 2008
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method
TOSHIBA KK4 citations63