Inventor

YE YAN

US512 patents

⚠️ This page may combine multiple inventors who share the name “YE YAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YE YAN

APPLIED MATERIALS INC

Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber

Inductively and multi-capacitively coupled plasma reactor

Capping layers for metal oxynitride TFTS

Capacitively coupled plasma reactor with magnetic plasma control

Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination

Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Externally excited torroidal plasma source with magnetic control of ion distribution

Gas distribution plate electrode for a plasma reactor

Externally excited torroidal plasma source with a gas distribution plate

Method of processing a workpiece using an externally excited torroidal plasma source

Externally excited torroidal plasma source

Method of pattern etching a low K dielectric layer

Method for high temperature etching of patterned layers using an organic mask stack

Method of etching patterned layers useful as masking during subsequent etching or for damascene structures

Process for copper etch back

Self-cleaning plasma processing reactor

Method and apparatus for cleaning by-products from plasma chamber surfaces

Method for etching low k dielectrics

Method of etching dielectric layers using a removable hardmask

Method of cleaning a semiconductor device processing chamber after a copper etch process

Lift pin for dechucking substrates

Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases

MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Externally excited multiple torroidal plasma source

Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate

Externally excited torroidal plasma source using a gas distribution plate

Plasma assisted processing chamber with separate control of species density

Inductively and multi-capacitively coupled plasma reactor

Process gas focusing apparatus and method

RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers

Plasma dry cleaning of semiconductor processing chambers

Substrate support having heat transfer system

Method and apparatus for forming metal interconnects

VID SCALE INC

Palette coding modes and palette flipping

Inter-component de-correlation for video coding

Color correction with a lookup table

Method and apparatus for the signaling of lossless video coding

Systems and methods for providing 3D look-up table coding for color gamut scalability

Enhanced deblocking filters for video coding

Intra block copy mode for screen content coding

Methods and systems for intra block copy coding with block vector derivation

Methods and systems for intra block copy coding with block vector derivation

YE YAN

Adaptive coding of video block prediction mode

Thin film transistors using multiple active channel layers

Treatment of gate dielectric for making high performance metal oxide and metal oxynitride thin film transistors

CHEN PEISONG

Video coding with large macroblocks

Video coding with large macroblocks

(unassigned)

Capacitively coupled plasma reactor with magnetic plasma control

BAO YILIANG

Video coding with fine granularity scalability using cycle-aligned fragments