Inventor
SHIFRIN EUGENE
US29 patents
⚠️ This page may combine multiple inventors who share the name “SHIFRIN EUGENE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
22 patentsUS10217625B2Feb 26, 2019
Continuous-wave laser-sustained plasma illumination source
KLA TENCOR CORP12 citations84
US9927094B2Mar 27, 2018
Plasma cell for providing VUV filtering in a laser-sustained plasma light source
KLA TENCOR CORP11 citations83
US9262821B2Feb 16, 2016
Inspection recipe setup from reference image variation
KLA TENCOR CORP8 citations83
US10395358B2Aug 27, 2019
High sensitivity repeater defect detection
KLA TENCOR CORP7 citations82
US9171364B2Oct 27, 2015
Wafer inspection using free-form care areas
KLA TENCOR CORP16 citations82
US9355208B2May 31, 2016
Detecting defects on a wafer
KLA TENCOR CORP8 citations79
US10887974B2Jan 5, 2021
High efficiency laser-sustained plasma light source
KLA TENCOR CORP2 citations73
US10381216B2Aug 13, 2019
Continuous-wave laser-sustained plasma illumination source
KLA TENCOR CORP2 citations73
US9766186B2Sep 19, 2017
Array mode repeater detection
KLA TENCOR CORP3 citations73
US9709811B2Jul 18, 2017
System and method for separation of pump light and collected light in a laser pumped light source
KLA TENCOR CORP2 citations73
US9734422B2Aug 15, 2017
System and method for enhanced defect detection with a digital matched filter
KLA TENCOR CORP5 citations72
US9727047B2Aug 8, 2017
Defect detection using structural information
KLA TENCOR CORP3 citations72
US9766187B2Sep 19, 2017
Repeater detection
KLA TENCOR CORP2 citations70
US10648925B2May 12, 2020
Repeater defect detection
KLA TENCOR CORP3 citations68
US10976025B2Apr 13, 2021
Plasma cell for providing VUV filtering in a laser-sustained plasma light source
KLA TENCOR CORP0 citations62
US10714327B2Jul 14, 2020
System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination
KLA TENCOR CORP1 citations62
US11204332B2Dec 21, 2021
Repeater defect detection
KLA TENCOR CORP0 citations58
US11139216B2Oct 5, 2021
System, method and non-transitory computer readable medium for tuning sensitivities of, and determining a process window for, a modulated wafer
KLA TENCOR CORP0 citations56
US11138722B2Oct 5, 2021
Differential imaging for single-path optical wafer inspection
KLA TENCOR CORP0 citations52
US10714307B2Jul 14, 2020
Neutral atom imaging system
KLA TENCOR CORP0 citations52
US10520741B2Dec 31, 2019
System and method for separation of pump light and collected light in a laser pumped light source
KLA TENCOR CORP0 citations52
US10679909B2Jun 9, 2020
System, method and non-transitory computer readable medium for tuning sensitivies of, and determining a process window for, a modulated wafer
KLA TENCOR CORP0 citations46
KLA TENCOR TECH CORP
2 patentsUS8041103B2Oct 18, 2011
Methods and systems for determining a position of inspection data in design data space
KLA TENCOR TECH CORP85 citations97
US7894659B2Feb 22, 2011
Methods for accurate identification of an edge of a care area for an array area formed on a wafer and methods for binning defects detected in an array area formed on a wafer
KLA TENCOR TECH CORP3 citations61