Inventor
RASTOGI VINAYAK
US11 patents
Patents
11 patentsUS9666447B2May 30, 2017
Method for selectivity enhancement during dry plasma etching
TOKYO ELECTRON LTD41 citations93
US9607843B2Mar 28, 2017
Method for roughness improvement and selectivity enhancement during arc layer etch via adjustment of carbon-fluorine content
TOKYO ELECTRON LTD40 citations93
US9576816B2Feb 21, 2017
Method for roughness improvement and selectivity enhancement during arc layer etch using hydrogen
TOKYO ELECTRON LTD38 citations93
US9530667B2Dec 27, 2016
Method for roughness improvement and selectivity enhancement during arc layer etch using carbon
TOKYO ELECTRON LTD38 citations93
US10366902B2Jul 30, 2019
Methods for cyclic etching of a patterned layer
TOKYO ELECTRON LTD2 citations72
US10971373B2Apr 6, 2021
Methods for cyclic etching of a patterned layer
TOKYO ELECTRON LTD0 citations62
US10535531B2Jan 14, 2020
Method of cyclic plasma etching of organic film using carbon-based chemistry
TOKYO ELECTRON LTD1 citations62
US10541146B2Jan 21, 2020
Method of cyclic plasma etching of organic film using sulfur-based chemistry
TOKYO ELECTRON LTD0 citations51
US10381235B2Aug 13, 2019
Method of selective silicon nitride etching
TOKYO ELECTRON LTD0 citations51
US9947597B2Apr 17, 2018
Defectivity metrology during DSA patterning
TOKYO ELECTRON LTD0 citations41
US9576812B2Feb 21, 2017
Partial etch memorization via flash addition
TOKYO ELECTRON LTD0 citations39