Inventor
HIBLOT GASPARD
BE18 patents
⚠️ This page may combine multiple inventors who share the name “HIBLOT GASPARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IMEC VZW
17 patentsUS11257764B2Feb 22, 2022
Integrated circuit with backside power delivery network and backside transistor
IMEC VZW7 citations84
US11121086B2Sep 14, 2021
Vertical isolated gate field effect transistor integrated in a semiconductor chip
IMEC VZW14 citations84
US10607901B2Mar 31, 2020
Stress sensor for semiconductor components
IMEC VZW6 citations71
US10998413B2May 4, 2021
Semiconductor fin structures having silicided portions
IMEC VZW2 citations70
US11038067B2Jun 15, 2021
Stress sensor suitable for measuring mechanical stress in a layered metallization structure of a microelectronic component
IMEC VZW2 citations65
US10811315B2Oct 20, 2020
Method for producing a through semiconductor via connection
IMEC VZW1 citations60
US12494424B2Dec 9, 2025
Interconnect structure of a semiconductor component and methods for producing the structure
IMEC VZW0 citations56
US11621295B2Apr 4, 2023
Bipolar selector device for a memory array
IMEC VZW0 citations56
US12154830B2Nov 26, 2024
Method of producing a gate cut in a semiconductor component
IMEC VZW0 citations51
US11765910B2Sep 19, 2023
Bipolar selector device for a memory array
IMEC VZW0 citations51
US11757039B2Sep 12, 2023
Method for inducing stress in semiconductor devices
IMEC VZW0 citations51
US12464805B2Nov 4, 2025
Method for forming an interconnection structure
IMEC VZW0 citations50
US11114337B2Sep 7, 2021
Method for bonding and interconnecting semiconductor chips
IMEC VZW0 citations47
US10903335B2Jan 26, 2021
Self-aligned internal spacer with EUV
IMEC VZW0 citations47
US12598966B2Apr 7, 2026
Method for producing a through semiconductor via connection
IMEC VZW0 citations46
US10712760B2Jul 14, 2020
Low-temperature voltage reference using coulomb blockade mechanism
IMEC VZW0 citations42
US10825806B2Nov 3, 2020
Semiconductor integrated circuit manufactured using a plasma-processing step
IMEC VZW0 citations39