Inventor
JHA PRAKET P
US22 patents
Patents
22 patentsUS10490436B2Nov 26, 2019
Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films
APPLIED MATERIALS INC10 citations83
US9390910B2Jul 12, 2016
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC5 citations83
US11170994B1Nov 9, 2021
CD dependent gap fill and conformal films
APPLIED MATERIALS INC3 citations72
US10410872B2Sep 10, 2019
Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask application
APPLIED MATERIALS INC5 citations72
US10373822B2Aug 6, 2019
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC2 citations72
US10612135B2Apr 7, 2020
Method and system for high temperature clean
APPLIED MATERIALS INC2 citations71
US10276353B2Apr 30, 2019
Dual-channel showerhead for formation of film stacks
APPLIED MATERIALS INC4 citations71
US10246772B2Apr 2, 2019
Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices
APPLIED MATERIALS INC5 citations70
US9490116B2Nov 8, 2016
Gate stack materials for semiconductor applications for lithographic overlay improvement
APPLIED MATERIALS INC3 citations70
US11804372B2Oct 31, 2023
CD dependent gap fill and conformal films
APPLIED MATERIALS INC0 citations62
US11508611B2Nov 22, 2022
Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films
APPLIED MATERIALS INC1 citations62
US11367614B2Jun 21, 2022
Surface roughness for flowable CVD film
APPLIED MATERIALS INC0 citations62
US11152248B2Oct 19, 2021
Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions
APPLIED MATERIALS INC1 citations62
US11060189B2Jul 13, 2021
Method to enable high temperature processing without chamber drifting
APPLIED MATERIALS INC0 citations62
US10707116B2Jul 7, 2020
Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions
APPLIED MATERIALS INC1 citations62
US9837265B2Dec 5, 2017
Gas flow profile modulated control of overlay in plasma CVD films
APPLIED MATERIALS INC1 citations62
US11011371B2May 18, 2021
SiBN film for conformal hermetic dielectric encapsulation without direct RF exposure to underlying structure material
APPLIED MATERIALS INC0 citations61
US11365476B2Jun 21, 2022
Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices
APPLIED MATERIALS INC1 citations59
US10199388B2Feb 5, 2019
VNAND tensile thick TEOS oxide
APPLIED MATERIALS INC1 citations58
US10595477B2Mar 24, 2020
Oxide with higher utilization and lower cost
APPLIED MATERIALS INC0 citations51
US10593543B2Mar 17, 2020
Method of depositing doped amorphous silicon films with enhanced defect control, reduced substrate sensitivity to in-film defects and bubble-free film growth
APPLIED MATERIALS INC0 citations50
US10483282B2Nov 19, 2019
VNAND tensile thick TEOS oxide
APPLIED MATERIALS INC0 citations47