Inventor

SRINIVASAN MUKUND

US50 patents

⚠️ This page may combine multiple inventors who share the name “SRINIVASAN MUKUND”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SRINIVASAN MUKUND

APPLIED MATERIALS INC

Low-K dielectric gapfill by flowable deposition

Development of high etch selective hardmask material by ion implantation into amorphous carbon films

Semiconductor process equipment

Methods and apparatus for three dimensional NAND structure fabrication

Semiconductor process equipment

Processing system containing an isolation region separating a deposition chamber from a treatment chamber

Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system

Sidewall passivation for plasma etching

Deposition of metal doped amorphous carbon film

Deposition of heteroatom-doped carbon films

Photo-assisted deposition of flowable films

Dynamic phased array plasma source for complete plasma coverage of a moving substrate

Conformal high concentration boron doping of semiconductors

Methods and apparatus for three dimensional NAND structure fabrication

Methods and apparatus for three dimensional NAND structure fabrication

Conformal high concentration boron doping of semiconductors

3D-NAND mold

Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions

Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions

NAND cell structure with charge trap cut

Ultra-thin dielectric diffusion barrier and etch stop layer for advanced interconnect applications

On stack overlay improvement for 3D NAND

Dielectric-metal stack for 3D flash memory application

Cyclic sequential processes for forming high quality thin films

Dielectric-metal stack for 3D flash memory application

LAM RES CORP

Stepped upper electrode for plasma processing uniformity

Stepped upper electrode for plasma processing uniformity

Chamber configuration for confining a plasma

Chamber configuration for confining a plasma

High aspect ratio etch using modulation of RF powers of various frequencies

Process for etching dielectric films with improved resist and/or etch profile characteristics

High aspect ratio etch using modulation of RF powers of various frequencies

Plasma processor in plasma confinement region within a vacuum chamber

Probe for direct wafer potential measurements

Multiple frequency plasma processor method and apparatus

Methods of reducing photoresist distortion while etching in a plasma processing system

Etch profile control

RF pulsing of a narrow gap capacitively coupled reactor

Methods for processing substrates using small plasma chambers

Small plasma chamber systems and methods

DHINDSA RAJINDER

Process tuning gas injection from the substrate edge

Integrated capacitive and inductive power sources for a plasma etching chamber

VMWARE INC

Framework for distributed key-value store in a wide area network

Framework for distributed key-value store in a wide area network

TAYLOR TRAVIS R

High lifetime consumable silicon nitride-silicon dioxide plasma processing components

GOTTSCHO RICHARD

Small plasma chamber systems and methods

TRANSF SR BRANDS LLC

System and method for personalized add-on purchase

GUPTA ANUBHAV

Hierarchical rate limiting of control packets

LOEWENHARDT PETER

Methods for RF pulsing of a narrow gap capacitively coupled reactor

ITTIAM SYSTEMS PTE LTD

System and method for upload and synchronization of media content to cloud based media services