Inventor

XIAO HANZHONG

US2 patents

Patents

2 patents

US7049052B2May 23, 2006

Method providing an improved bi-layer photoresist pattern

LAM RES CORP6 citations58

US6949469B1Sep 27, 2005

Methods and apparatus for the optimization of photo resist etching in a plasma processing system

LAM RES CORP1 citations46