Inventor
SCHÖNBERGER RALF
DE2 patents
Patents
2 patentsUS11150552B2Oct 19, 2021
Method and apparatus for analyzing a defective location of a photolithographic mask
ZEISS CARL SMT GMBH0 citations53
US9863760B2Jan 9, 2018
Method and device for determining a reference point of an orientation marking on a substrate of a photolithographic mask in an automated manner
ZEISS CARL SMT GMBH0 citations34