P

Inventor

MUKAI KIICHIRO

JP21 patents
⚠️ This page may combine multiple inventors who share the name “MUKAI KIICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

20 patents
US4897709AJan 30, 1990

Titanium nitride film in contact hole with large aspect ratio

HITACHI LTD151 citations99
US4857137AAug 15, 1989

Process for surface treatment

HITACHI LTD520 citations99
US4891684AJan 2, 1990

Semiconductor device

HITACHI LTD84 citations96
US4599135AJul 8, 1986

Thin film deposition

HITACHI LTD82 citations96
US5292673AMar 8, 1994

Method of manufacturing a semiconductor device

HITACHI LTD99 citations95
US4365264ADec 21, 1982

Semiconductor device with high density low temperature deposited Siw Nx Hy Oz passivating layer

HITACHI LTD91 citations95
US5643473AJul 1, 1997

Dry etching method

HITACHI LTD21 citations92
US5391915AFeb 21, 1995

Integrated circuit having reduced soft errors and reduced penetration of alkali impurities into the substrate

HITACHI LTD22 citations92
US5147500ASep 15, 1992

Dry etching method

HITACHI LTD32 citations92
US5079191AJan 7, 1992

Process for producing a semiconductor device

HITACHI LTD39 citations92
US4943344AJul 24, 1990

Etching method

HITACHI LTD41 citations92
US4937650AJun 26, 1990

Semiconductor capacitor device with dual dielectric

HITACHI LTD39 citations92
US4842891AJun 27, 1989

Method of forming a copper film by chemical vapor deposition

HITACHI LTD27 citations92
US4636833AJan 13, 1987

Semiconductor device

HITACHI LTD34 citations92
US4956043ASep 11, 1990

Dry etching apparatus

HITACHI LTD46 citations89
US5013526AMay 7, 1991

Superconducting alloys comprising tungsten, molybdenum, silicon and oxygen

HITACHI LTD13 citations74
US4570175AFeb 11, 1986

Three-dimensional semiconductor device with thin film monocrystalline member contacting substrate at a plurality of locations

HITACHI LTD11 citations74
US6747339B1Jun 8, 2004

Integrated circuit having reduced soft errors and reduced penetration of alkali impurities into the substrate

HITACHI LTD11 citations73
US4926238AMay 15, 1990

Semiconductor device and method for producing the same

HITACHI LTD17 citations73
US4809052AFeb 28, 1989

Semiconductor memory device

HITACHI LTD7 citations73

TOSHIBA KK

1 patent