Inventor
TAN SHIRO
JP36 patents
⚠️ This page may combine multiple inventors who share the name “TAN SHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJI PHOTO FILM CO LTD
34 patentsUS6042991AMar 28, 2000
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD49 citations96
US6136504AOct 24, 2000
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD30 citations93
US5340686AAug 23, 1994
Positive-type photoresist composition
FUJI PHOTO FILM CO LTD26 citations92
US4883739ANov 28, 1989
Light-sensitive resin composition with 1,2-naphthoquinone diazide compound having spirobichroman or spirobiinoane ring
FUJI PHOTO FILM CO LTD25 citations92
US6277541B1Aug 21, 2001
Photosensitive lithographic printing plate
FUJI PHOTO FILM CO LTD20 citations91
US6114089ASep 5, 2000
Positive working photosensitive lithographic printing plate
FUJI PHOTO FILM CO LTD32 citations91
US7105270B2Sep 12, 2006
Fluoroaliphatic group-containing copolymer
FUJI PHOTO FILM CO LTD16 citations84
US6830872B2Dec 14, 2004
Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound
FUJI PHOTO FILM CO LTD13 citations84
US6740470B2May 25, 2004
Lithographic printing plate precursor
FUJI PHOTO FILM CO LTD15 citations84
US6709800B2Mar 23, 2004
Presensitized plate for preparing lithographic printing plate
FUJI PHOTO FILM CO LTD16 citations84
US6638683B1Oct 28, 2003
Positive photoresist composition
FUJI PHOTO FILM CO LTD19 citations84
US6630280B1Oct 7, 2003
Positive photoresist composition
FUJI PHOTO FILM CO LTD15 citations84
US6489080B2Dec 3, 2002
Positive resist composition
FUJI PHOTO FILM CO LTD19 citations84
US5948587ASep 7, 1999
Positive working photoresist composition
FUJI PHOTO FILM CO LTD18 citations84
US5709977AJan 20, 1998
Positive working photoresist composition
FUJI PHOTO FILM CO LTD19 citations84
US6780562B2Aug 24, 2004
Lithographic printing plate precursor
FUJI PHOTO FILM CO LTD9 citations74
US6517987B2Feb 11, 2003
Positive-working presensitized plate useful for preparing a lithographic printing plate
FUJI PHOTO FILM CO LTD7 citations74
US6416925B1Jul 9, 2002
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD13 citations74
US6207343B1Mar 27, 2001
Positive photosensitive composition
FUJI PHOTO FILM CO LTD12 citations74
US6004721ADec 21, 1999
Positive photoresist composition
FUJI PHOTO FILM CO LTD14 citations74
US5683851ANov 4, 1997
Positive photoresist composition
FUJI PHOTO FILM CO LTD8 citations74
US5652081AJul 29, 1997
Positive working photoresist composition
FUJI PHOTO FILM CO LTD15 citations74
US5494773AFeb 27, 1996
Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group
FUJI PHOTO FILM CO LTD9 citations74
US5429905AJul 4, 1995
Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound
FUJI PHOTO FILM CO LTD11 citations74
US5380618AJan 10, 1995
Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent
FUJI PHOTO FILM CO LTD10 citations73
US6379860B1Apr 30, 2002
Positive photosensitive composition
FUJI PHOTO FILM CO LTD11 citations72
US5358824AOct 25, 1994
Photosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ring
FUJI PHOTO FILM CO LTD9 citations72
US6692883B2Feb 17, 2004
Positive photoresist composition
FUJI PHOTO FILM CO LTD3 citations63
US6660445B2Dec 9, 2003
Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
FUJI PHOTO FILM CO LTD3 citations63
US5620828AApr 15, 1997
Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator
FUJI PHOTO FILM CO LTD5 citations63
US5576139ANov 19, 1996
Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst
FUJI PHOTO FILM CO LTD3 citations63
US5318875AJun 7, 1994
Positive quinonediazide photoresist composition containing select hydroxyphenol additive
FUJI PHOTO FILM CO LTD3 citations63
US5324618AJun 28, 1994
Positive type quinonediazide photoresist composition containing select tetraphenolic additive
FUJI PHOTO FILM CO LTD1 citations52
US7144678B2Dec 5, 2006
Lithographic printing plate precursor
FUJI PHOTO FILM CO LTD0 citations42