Inventor
KAJI TETSUNORI
JP39 patents
⚠️ This page may combine multiple inventors who share the name “KAJI TETSUNORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
36 patentsUS6197151B1Mar 6, 2001
Plasma processing apparatus and plasma processing method
HITACHI LTD223 citations99
US6171438B1Jan 9, 2001
Plasma processing apparatus and plasma processing method
HITACHI LTD100 citations99
US6245190B1Jun 12, 2001
Plasma processing system and plasma processing method
HITACHI LTD194 citations98
US6129806AOct 10, 2000
Plasma processing apparatus and plasma processing method
HITACHI LTD92 citations98
US6422172B1Jul 23, 2002
Plasma processing apparatus and plasma processing method
HITACHI LTD100 citations97
US6815365B2Nov 9, 2004
Plasma etching apparatus and plasma etching method
HITACHI LTD44 citations96
US6815228B2Nov 9, 2004
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD60 citations96
US5895586AApr 20, 1999
Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum
HITACHI LTD74 citations96
US5432315AJul 11, 1995
Plasma process apparatus including ground electrode with protection film
HITACHI LTD68 citations96
US6961131B2Nov 1, 2005
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD24 citations93
US6903826B2Jun 7, 2005
Method and apparatus for determining endpoint of semiconductor element fabricating process
HITACHI LTD33 citations93
US6172321B1Jan 9, 2001
Method and apparatus for plasma processing apparatus
HITACHI LTD26 citations93
US6034346AMar 7, 2000
Method and apparatus for plasma processing apparatus
HITACHI LTD27 citations93
US5646489AJul 8, 1997
Plasma generator with mode restricting means
HITACHI LTD43 citations93
US5433789AJul 18, 1995
Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves
HITACHI LTD22 citations93
US6902683B1Jun 7, 2005
Plasma processing apparatus and plasma processing method
HITACHI LTD29 citations92
US5804033ASep 8, 1998
Microwave plasma processing method and apparatus
HITACHI LTD32 citations92
US5580420ADec 3, 1996
Plasma generating method and apparatus and plasma processing method and apparatus
HITACHI LTD39 citations92
US5391260AFeb 21, 1995
Vacuum processing apparatus
HITACHI LTD24 citations92
US5290993AMar 1, 1994
Microwave plasma processing device
HITACHI LTD42 citations92
US3973252AAug 3, 1976
Line progressive scanning method for liquid crystal display panel
HITACHI LTD46 citations89
US5118378AJun 2, 1992
Apparatus for detecting an end point of etching
HITACHI LTD35 citations87
US6596551B1Jul 22, 2003
Etching end point judging method, etching end point judging device, and insulating film etching method using these methods
HITACHI LTD17 citations84
US7411684B2Aug 12, 2008
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD5 citations74
US7126697B2Oct 24, 2006
Method and apparatus for determining endpoint of semiconductor element fabricating process
HITACHI LTD5 citations74
US7009715B2Mar 7, 2006
Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed
HITACHI LTD7 citations74
US6046425AApr 4, 2000
Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber
HITACHI LTD10 citations74
US5607510AMar 4, 1997
Vacuum processing apparatus
HITACHI LTD9 citations74
US3935590AJan 27, 1976
Apparatus for displaying colored image
HITACHI LTD11 citations74
US6716300B2Apr 6, 2004
Emission spectroscopic processing apparatus
HITACHI LTD8 citations72
US7230720B2Jun 12, 2007
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD3 citations63
US7048869B2May 23, 2006
Plasma processing apparatus and a plasma processing method
HITACHI LTD6 citations63
US4081717AMar 28, 1978
Zigzag shifting self-transfer type display device
HITACHI LTD2 citations62
US7455790B2Nov 25, 2008
Emission spectroscopic processing apparatus and plasma processing method using it
HITACHI LTD2 citations61
US4053812AOct 11, 1977
System for driving a display device
HITACHI LTD2 citations61
US5729027AMar 17, 1998
Ion implanter
HITACHI LTD0 citations52
HITACHI HIGH TECH CORP
3 patentsUS6979168B2Dec 27, 2005
Method and apparatus for transferring substrate
HITACHI HIGH TECH CORP34 citations88
US6758647B2Jul 6, 2004
System for producing wafers
HITACHI HIGH TECH CORP51 citations88
US6890771B2May 10, 2005
Plasma processing method using spectroscopic processing unit
HITACHI HIGH TECH CORP6 citations72