Inventor
YOSHIGAI MOTOHIKO
JP42 patents
⚠️ This page may combine multiple inventors who share the name “YOSHIGAI MOTOHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
26 patentsUS6815228B2Nov 9, 2004
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD60 citations96
US5681424AOct 28, 1997
Plasma processing method
HITACHI LTD54 citations96
US5432315AJul 11, 1995
Plasma process apparatus including ground electrode with protection film
HITACHI LTD68 citations96
US6664738B2Dec 16, 2003
Plasma processing apparatus
HITACHI LTD52 citations95
US6961131B2Nov 1, 2005
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD24 citations93
US6903826B2Jun 7, 2005
Method and apparatus for determining endpoint of semiconductor element fabricating process
HITACHI LTD33 citations93
US6677244B2Jan 13, 2004
Specimen surface processing method
HITACHI LTD18 citations92
US6660647B1Dec 9, 2003
Method for processing surface of sample
HITACHI LTD28 citations92
US6235146B1May 22, 2001
Vacuum treatment system and its stage
HITACHI LTD22 citations92
US5290993AMar 1, 1994
Microwave plasma processing device
HITACHI LTD42 citations92
US7601241B2Oct 13, 2009
Plasma processing apparatus and plasma processing method
HITACHI LTD9 citations84
US6620737B2Sep 16, 2003
Plasma etching method
HITACHI LTD13 citations83
US7411684B2Aug 12, 2008
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD5 citations74
US7126697B2Oct 24, 2006
Method and apparatus for determining endpoint of semiconductor element fabricating process
HITACHI LTD5 citations74
US7009715B2Mar 7, 2006
Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed
HITACHI LTD7 citations74
US6046425AApr 4, 2000
Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber
HITACHI LTD10 citations74
US6838833B2Jan 4, 2005
Plasma processing apparatus
HITACHI LTD10 citations73
US6191045B1Feb 20, 2001
Method of treating surface of sample
HITACHI LTD10 citations73
US6617255B2Sep 9, 2003
Plasma processing method for working the surface of semiconductor devices
HITACHI LTD7 citations72
US7259104B2Aug 21, 2007
Sample surface processing method
HITACHI LTD2 citations63
US7230720B2Jun 12, 2007
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD3 citations63
US6743733B2Jun 1, 2004
Process for producing a semiconductor device including etching using a multi-step etching treatment having different gas compositions in each step
HITACHI LTD4 citations63
US6492277B1Dec 10, 2002
Specimen surface processing method and apparatus
HITACHI LTD4 citations63
US7098138B2Aug 29, 2006
Plasma processing method for working the surface of semiconductor devices
HITACHI LTD2 citations61
US7771607B2Aug 10, 2010
Plasma processing apparatus and plasma processing method
HITACHI LTD1 citations52
US7049243B2May 23, 2006
Surface processing method of a specimen and surface processing apparatus of the specimen
HITACHI LTD0 citations52
HITACHI HIGH TECH CORP
11 patentsUS7931776B2Apr 26, 2011
Plasma processing apparatus
HITACHI HIGH TECH CORP8 citations84
US7396771B2Jul 8, 2008
Plasma etching apparatus and plasma etching method
HITACHI HIGH TECH CORP15 citations84
US7224568B2May 29, 2007
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP12 citations83
US7194821B2Mar 27, 2007
Vacuum processing apparatus and vacuum processing method
HITACHI HIGH TECH CORP12 citations83
US7259866B2Aug 21, 2007
Semiconductor fabricating apparatus with function of determining etching processing state
HITACHI HIGH TECH CORP9 citations73
US7442651B2Oct 28, 2008
Plasma etching method
HITACHI HIGH TECH CORP2 citations62
US7303998B2Dec 4, 2007
Plasma processing method
HITACHI HIGH TECH CORP2 citations62
US6916396B2Jul 12, 2005
Etching system and etching method
HITACHI HIGH TECH CORP4 citations62
US6897403B2May 24, 2005
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP3 citations62
US7955514B2Jun 7, 2011
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US6837937B2Jan 4, 2005
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations51