Inventor
ISHIZAKA NOBUKAZU
JP16 patents
Patents
16 patentsUS6676757B2Jan 13, 2004
Coating film forming apparatus and coating unit
TOKYO ELECTRON LTD60 citations96
US6383948B1May 7, 2002
Coating film forming apparatus and coating film forming method
TOKYO ELECTRON LTD57 citations96
US6193783B1Feb 27, 2001
Apparatus and method for supplying a process solution
TOKYO ELECTRON LTD70 citations96
US5636401AJun 10, 1997
Cleaning apparatus and cleaning method
TOKYO ELECTRON LTD47 citations95
US6872256B2Mar 29, 2005
Film forming unit
TOKYO ELECTRON LTD25 citations92
US6824616B2Nov 30, 2004
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD20 citations92
US6616760B2Sep 9, 2003
Film forming unit
TOKYO ELECTRON LTD28 citations92
US6605153B2Aug 12, 2003
Coating film forming apparatus
TOKYO ELECTRON LTD26 citations92
US6514344B2Feb 4, 2003
Film forming unit
TOKYO ELECTRON LTD28 citations92
US6391111B1May 21, 2002
Coating apparatus
TOKYO ELECTRON LTD50 citations92
US6716478B2Apr 6, 2004
Coating film forming apparatus and coating film forming method
TOKYO ELECTRON LTD17 citations84
US6773510B2Aug 10, 2004
Substrate processing unit
TOKYO ELECTRON LTD17 citations83
US7087118B2Aug 8, 2006
Coating film forming apparatus and coating unit
TOKYO ELECTRON LTD6 citations73
US6936107B2Aug 30, 2005
Coating film forming apparatus and coating unit
TOKYO ELECTRON LTD11 citations73
US5882426AMar 16, 1999
Method of cleaning a substrate by scrubbing
TOKYO ELECTRON LTD6 citations73
US7179504B2Feb 20, 2007
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD4 citations62