Inventor
CHEN FUFA
US27 patents
⚠️ This page may combine multiple inventors who share the name “CHEN FUFA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ACM RESEARCH SHANGHAI INC
17 patentsUS11581205B2Feb 14, 2023
Methods and system for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC2 citations73
US11257667B2Feb 22, 2022
Methods and apparatus for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC2 citations73
US11141762B2Oct 12, 2021
System for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC3 citations73
US11037804B2Jun 15, 2021
Methods and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC2 citations73
US10910244B2Feb 2, 2021
Methods and system for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC2 citations73
US12111575B2Oct 8, 2024
Coater with automatic cleaning function and coater automatic cleaning method
ACM RESEARCH SHANGHAI INC0 citations62
US11967497B2Apr 23, 2024
Methods and apparatus for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC0 citations62
US11911807B2Feb 27, 2024
Method and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC0 citations62
US11911808B2Feb 27, 2024
System for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC0 citations62
US11848217B2Dec 19, 2023
Methods and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC0 citations62
US11752529B2Sep 12, 2023
Method for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC0 citations62
US11638937B2May 2, 2023
Methods and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC0 citations62
US11633765B2Apr 25, 2023
System for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC0 citations62
US11103898B2Aug 31, 2021
Methods and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC0 citations62
US10816901B2Oct 27, 2020
Coater with automatic cleaning function and coater automatic cleaning method
ACM RESEARCH SHANGHAI INC0 citations51
US8671961B2Mar 18, 2014
Methods and apparatus for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC1 citations51
US10770335B2Sep 8, 2020
Substrate supporting apparatus
ACM RESEARCH SHANGHAI INC0 citations40
APPLIED MATERIALS INC
9 patentsUS6364949B1Apr 2, 2002
300 mm CVD chamber design for metal-organic thin film deposition
APPLIED MATERIALS INC424 citations98
US6220091B1Apr 24, 2001
Liquid level pressure sensor and method
APPLIED MATERIALS INC53 citations92
US6179277B1Jan 30, 2001
Liquid vaporizer systems and methods for their use
APPLIED MATERIALS INC33 citations92
US6660135B2Dec 9, 2003
Staged aluminum deposition process for filling vias
APPLIED MATERIALS INC21 citations91
US6352620B2Mar 5, 2002
Staged aluminum deposition process for filling vias
APPLIED MATERIALS INC27 citations91
US6436820B1Aug 20, 2002
Method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film having a combined thickness greater than 1000 Å
APPLIED MATERIALS INC31 citations90
US6221174B1Apr 24, 2001
Method of performing titanium/titanium nitride integration
APPLIED MATERIALS INC15 citations83
US6332601B1Dec 25, 2001
Liquid vaporizers for semiconductor processing systems
APPLIED MATERIALS INC6 citations73
US6086676AJul 11, 2000
Programmable electrical interlock system for a vacuum processing system
APPLIED MATERIALS INC15 citations73