Inventor
BERGMAN ERIC J
US74 patents
⚠️ This page may combine multiple inventors who share the name “BERGMAN ERIC J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMITOOL INC
41 patentsUS6240933B1Jun 5, 2001
Methods for cleaning semiconductor surfaces
SEMITOOL INC118 citations99
US5377708AJan 3, 1995
Multi-station semiconductor processor with volatilization
SEMITOOL INC247 citations99
US5235995AAug 17, 1993
Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization
SEMITOOL INC168 citations99
US6273108B1Aug 14, 2001
Apparatus and method for processing the surface of a workpiece with ozone
SEMITOOL INC93 citations98
US6267125B1Jul 31, 2001
Apparatus and method for processing the surface of a workpiece with ozone
SEMITOOL INC104 citations98
US5762751AJun 9, 1998
Semiconductor processor with wafer face protection
SEMITOOL INC120 citations98
US5489341AFeb 6, 1996
Semiconductor processing with non-jetting fluid stream discharge array
SEMITOOL INC116 citations98
US5232511AAug 3, 1993
Dynamic semiconductor wafer processing using homogeneous mixed acid vapors
SEMITOOL INC123 citations98
US6286231B1Sep 11, 2001
Method and apparatus for high-pressure wafer processing and drying
SEMITOOL INC178 citations97
US6869487B1Mar 22, 2005
Process and apparatus for treating a workpiece such as a semiconductor wafer
SEMITOOL INC53 citations96
US6497768B2Dec 24, 2002
Process for treating a workpiece with hydrofluoric acid and ozone
SEMITOOL INC53 citations96
US6192600B1Feb 27, 2001
Thermocapillary dryer
SEMITOOL INC45 citations96
US5584310ADec 17, 1996
Semiconductor processing with non-jetting fluid stream discharge array
SEMITOOL INC62 citations96
US5370741ADec 6, 1994
Dynamic semiconductor wafer processing using homogeneous chemical vapors
SEMITOOL INC81 citations96
US5332445AJul 26, 1994
Aqueous hydrofluoric acid vapor processing of semiconductor wafers
SEMITOOL INC62 citations96
US5238500AAug 24, 1993
Aqueous hydrofluoric and hydrochloric acid vapor processing of semiconductor wafers
SEMITOOL INC90 citations96
US6817370B2Nov 16, 2004
Method for processing the surface of a workpiece
SEMITOOL INC29 citations95
US6591845B1Jul 15, 2003
Apparatus and method for processing the surface of a workpiece with ozone
SEMITOOL INC33 citations95
US6357142B1Mar 19, 2002
Method and apparatus for high-pressure wafer processing and drying
SEMITOOL INC43 citations95
US5954911ASep 21, 1999
Semiconductor processing using vapor mixtures
SEMITOOL INC57 citations95
US6843857B2Jan 18, 2005
Methods for cleaning semiconductor surfaces
SEMITOOL INC27 citations93
US6837252B2Jan 4, 2005
Apparatus for treating a workpiece with steam and ozone
SEMITOOL INC21 citations93
US6830628B2Dec 14, 2004
Methods for cleaning semiconductor surfaces
SEMITOOL INC23 citations93
US6401732B2Jun 11, 2002
Thermocapillary dryer
SEMITOOL INC24 citations93
US6199298B1Mar 13, 2001
Vapor assisted rotary drying method and apparatus
SEMITOOL INC37 citations93
US6746565B1Jun 8, 2004
Semiconductor processor with wafer face protection
SEMITOOL INC19 citations92
US6701941B1Mar 9, 2004
Method for treating the surface of a workpiece
SEMITOOL INC18 citations92
US6601594B2Aug 5, 2003
Apparatus and method for delivering a treatment liquid and ozone to treat the surface of a workpiece
SEMITOOL INC20 citations92
US6488038B1Dec 3, 2002
Method for cleaning semiconductor substrates
SEMITOOL INC27 citations92
US6745494B2Jun 8, 2004
Method and apparatus for processing wafers under pressure
SEMITOOL INC21 citations91
US6543156B2Apr 8, 2003
Method and apparatus for high-pressure wafer processing and drying
SEMITOOL INC14 citations91
US6319841B1Nov 20, 2001
Semiconductor processing using vapor mixtures
SEMITOOL INC16 citations91
US6162734ADec 19, 2000
Semiconductor processing using vapor mixtures
SEMITOOL INC32 citations91
US7264680B2Sep 4, 2007
Process and apparatus for treating a workpiece using ozone
SEMITOOL INC29 citations86
US7416611B2Aug 26, 2008
Process and apparatus for treating a workpiece with gases
SEMITOOL INC17 citations84
US7404863B2Jul 29, 2008
Methods of thinning a silicon wafer using HF and ozone
SEMITOOL INC12 citations84
US7163588B2Jan 16, 2007
Processing a workpiece using water, a base, and ozone
SEMITOOL INC11 citations84
US8028978B2Oct 4, 2011
Wafer handling system
SEMITOOL INC11 citations82
US7378355B2May 27, 2008
System and methods for polishing a wafer
SEMITOOL INC10 citations77
US5357991AOct 25, 1994
Gas phase semiconductor processor with liquid phase mixing
SEMITOOL INC18 citations74
US6022484AFeb 8, 2000
Semiconductor processor with wafer face protection
SEMITOOL INC7 citations73
APPLIED MATERIALS INC
7 patentsUS12116686B2Oct 15, 2024
Parameter adjustment model for semiconductor processing chambers
APPLIED MATERIALS INC2 citations71
US11634830B2Apr 25, 2023
Electrochemical depositions of nanotwin copper materials
APPLIED MATERIALS INC2 citations71
US10546762B2Jan 28, 2020
Drying high aspect ratio features
APPLIED MATERIALS INC6 citations71
US10002771B1Jun 19, 2018
Methods for chemical mechanical polishing (CMP) processing with ozone
APPLIED MATERIALS INC3 citations67
US12544805B2Feb 10, 2026
Method and apparatus to enable droplet jet cleaning at elevated temperature
APPLIED MATERIALS INC0 citations63
US11788200B2Oct 17, 2023
Fluid recovery in semiconductor processing
APPLIED MATERIALS INC0 citations62
US11352711B2Jun 7, 2022
Fluid recovery in semiconductor processing
APPLIED MATERIALS INC0 citations62
(unassigned)
2 patentsShowing the top 50 of 74 patents by PatentIndex Score.