Inventor
COOK LEE MELBOURNE
US54 patents
⚠️ This page may combine multiple inventors who share the name “COOK LEE MELBOURNE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RODEL INC
44 patentsUS6022268AFeb 8, 2000
Polishing pads and methods relating thereto
RODEL INC157 citations99
US6454634B1Sep 24, 2002
Polishing pads for chemical mechanical planarization
RODEL INC123 citations98
US6022264AFeb 8, 2000
Polishing pad and methods relating thereto
RODEL INC99 citations98
US6017265AJan 25, 2000
Methods for using polishing pads
RODEL INC186 citations98
US5738800AApr 14, 1998
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC117 citations98
US6749485B1Jun 15, 2004
Hydrolytically stable grooved polishing pads for chemical mechanical planarization
RODEL INC98 citations97
US6736709B1May 18, 2004
Grooved polishing pads for chemical mechanical planarization
RODEL INC96 citations97
US5693239ADec 2, 1997
Polishing slurries comprising two abrasive components and methods for their use
RODEL INC133 citations97
US6582283B2Jun 24, 2003
Polishing pads for chemical mechanical planarization
RODEL INC71 citations96
US6488570B1Dec 3, 2002
Method relating to a polishing system having a multi-phase polishing layer
RODEL INC68 citations96
US6375559B1Apr 23, 2002
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC61 citations96
US6210254B1Apr 3, 2001
Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s)
RODEL INC45 citations96
US6074546AJun 13, 2000
Method for photoelectrochemical polishing of silicon wafers
RODEL INC46 citations96
US6036579AMar 14, 2000
Polymeric polishing pad having photolithographically induced surface patterns(s) and methods relating thereto
RODEL INC82 citations96
US6019666AFeb 1, 2000
Mosaic polishing pads and methods relating thereto
RODEL INC69 citations96
US5932486AAug 3, 1999
Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers
RODEL INC83 citations96
US5860848AJan 19, 1999
Polishing silicon wafers with improved polishing slurries
RODEL INC99 citations96
US5756398AMay 26, 1998
Composition and method for polishing a composite comprising titanium
RODEL INC52 citations96
US6682402B1Jan 27, 2004
Polishing pads and methods relating thereto
RODEL INC47 citations95
US6293852B1Sep 25, 2001
Polishing pads and methods relating thereto
RODEL INC46 citations95
US6231434B1May 15, 2001
Polishing pads and methods relating thereto
RODEL INC44 citations95
US6218305B1Apr 17, 2001
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC72 citations95
US6217434B1Apr 17, 2001
Polishing pads and methods relating thereto
RODEL INC50 citations95
US6132637AOct 17, 2000
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC44 citations95
US6042741AMar 28, 2000
Composition for polishing a composite of silica and silicon nitride
RODEL INC74 citations95
US5770103AJun 23, 1998
Composition and method for polishing a composite comprising titanium
RODEL INC66 citations95
US6354915B1Mar 12, 2002
Polishing pads and methods relating thereto
RODEL INC54 citations94
US5769689AJun 23, 1998
Compositions and methods for polishing silica, silicates, and silicon nitride
RODEL INC97 citations94
US6375694B1Apr 23, 2002
Polishing slurry compositions capable of providing multi-modal particle packing
RODEL INC19 citations93
US6093649AJul 25, 2000
Polishing slurry compositions capable of providing multi-modal particle packing and methods relating thereto
RODEL INC43 citations93
US6030899AFeb 29, 2000
Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers
RODEL INC21 citations93
US6648733B2Nov 18, 2003
Polishing pads and methods relating thereto
RODEL INC45 citations92
US6425816B1Jul 30, 2002
Polishing pads and methods relating thereto
RODEL INC24 citations92
US6325703B2Dec 4, 2001
Polishing pads and methods relating thereto
RODEL INC23 citations92
US6287185B1Sep 11, 2001
Polishing pads and methods relating thereto
RODEL INC27 citations92
US6284114B1Sep 4, 2001
Method of fabricating a porous polymeric material by electrophoretic deposition
RODEL INC28 citations92
US6106754AAug 22, 2000
Method of making polishing pads
RODEL INC35 citations92
US6001269ADec 14, 1999
Method for polishing a composite comprising an insulator, a metal, and titanium
RODEL INC48 citations92
US6500053B2Dec 31, 2002
Polishing pads and methods relating thereto
RODEL INC42 citations91
US6319370B1Nov 20, 2001
Apparatus for photoelectrochemical polishing of silicon wafers
RODEL INC6 citations74
US6245679B1Jun 12, 2001
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
RODEL INC13 citations74
US6210525B1Apr 3, 2001
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
RODEL INC14 citations74
US6739962B2May 25, 2004
Polishing pads and methods relating thereto
RODEL INC9 citations73
US6518188B2Feb 11, 2003
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
RODEL INC3 citations63
ROHM & HAAS ELECT MAT
4 patentsUS6848977B1Feb 1, 2005
Polishing pad for electrochemical mechanical polishing
ROHM & HAAS ELECT MAT94 citations98
US6869350B2Mar 22, 2005
Polishing pads and methods relating thereto
ROHM & HAAS ELECT MAT32 citations92
US6843712B2Jan 18, 2005
Polishing pads and methods relating thereto
ROHM & HAAS ELECT MAT10 citations73
US9299585B2Mar 29, 2016
Method for chemical mechanical polishing substrates containing ruthenium and copper
ROHM & HAAS ELECT MAT2 citations62
ROHM AND HAAS ELECTRIC MATERIA
1 patentROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC
1 patentShowing the top 50 of 54 patents by PatentIndex Score.