Inventor
DIECKMANN NILS
DE16 patents
⚠️ This page may combine multiple inventors who share the name “DIECKMANN NILS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
7 patentsUS7408616B2Aug 5, 2008
Microlithographic exposure method as well as a projection exposure system for carrying out the method
ZEISS CARL SMT AG70 citations97
US7847921B2Dec 7, 2010
Microlithographic exposure method as well as a projection exposure system for carrying out the method
ZEISS CARL SMT AG30 citations92
US7329886B2Feb 12, 2008
EUV illumination system having a plurality of light sources for illuminating an optical element
ZEISS CARL SMT AG18 citations83
US6985218B2Jan 10, 2006
Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus
ZEISS CARL SMT AG8 citations73
US6936825B2Aug 30, 2005
Process for the decontamination of microlithographic projection exposure devices
ZEISS CARL SMT AG8 citations68
US7808615B2Oct 5, 2010
Projection exposure apparatus and method for operating the same
ZEISS CARL SMT AG2 citations62
US7593095B2Sep 22, 2009
System for reducing the coherence of laser radiation
ZEISS CARL SMT AG1 citations52
DIECKMANN NILS
4 patentsUS9116441B2Aug 25, 2015
Illumination system of a microlithographic projection exposure apparatus
DIECKMANN NILS0 citations47
US8169594B2May 1, 2012
Illumination system of a microlithographic projection exposure apparatus
DIECKMANN NILS0 citations47
US8488104B2Jul 16, 2013
Projection objective with diaphragms
DIECKMANN NILS1 citations46
US9274435B2Mar 1, 2016
Illumination system or projection objective of a microlithographic projection exposure apparatus
DIECKMANN NILS0 citations39