Inventor

KOMURO YOSHITAKA

JP42 patents

⚠️ This page may combine multiple inventors who share the name “KOMURO YOSHITAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOMURO YOSHITAKA

TOKYO OHKA KOGYO CO LTD

Resist composition, compound, polymeric compound and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, and acid generator

Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound

Resist composition, acid generator, polymeric compound and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method for forming resist pattern, and compound

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, and method of forming resist pattern

Resist composition, method for forming resist pattern, compound, and acid generator

Resist composition, method for forming resist pattern, and polymer compound

Negative resist composition, method of forming resist pattern, and complex

Resist composition, method of forming resist pattern and compound

Compound, acid generator, resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

Resist composition and method of forming resist pattern

Negative resist composition, method of forming resist pattern and complex

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern

Resist composition, method of forming resist pattern, and compound

Method of producing block copolymer capable of creating specific structure pattern

Method for manufacturing polymer compound

Resist composition, method of forming resist pattern, polymeric compound and compound

Resist composition, method of forming resist pattern, compound, and polymeric compound

Method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and resist pattern forming method

Method of preparing polymer compound

UTSUMI YOSHIYUKI

Compound

Resist composition, method of forming resist pattern, novel compound and acid generator

Resist composition and method of forming resist pattern

TOKYO ELECTRON LTD

Pattern forming method

Pattern forming method for forming a pattern

SAN APRO LTD

Sulfonium salt and photo-acid generator

KOMURO YOSHITAKA

Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern

MATSUZAWA KENSUKE

Resist composition, method of forming resist pattern and polymeric compound

HYOGO PREFECTURE

Photosensitive resin, and photosensitive composition

SESHIMO TAKEHIRO

Positive resist composition, method of forming resist pattern, and polymeric compound

AIST

Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist composition, and resist pattern forming method

DAICEL CORP

Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound