Inventor
USENKO ALEX
US18 patents
⚠️ This page may combine multiple inventors who share the name “USENKO ALEX”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
4 patentsUS10923503B2Feb 16, 2021
Semiconductor-on-insulator (SOI) substrate comprising a trap-rich layer with small grain sizes
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11764054B2Sep 19, 2023
Methods of forming SOI substrates
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10840080B2Nov 17, 2020
Methods of forming SOI substrates
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US12211686B2Jan 28, 2025
Methods of forming SOI substrates
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
CORNING INC
3 patentsUS8357974B2Jan 22, 2013
Semiconductor on glass substrate with stiffening layer and process of making the same
CORNING INC8 citations82
US8003491B2Aug 23, 2011
Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation
CORNING INC5 citations62
US7816225B2Oct 19, 2010
Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation
CORNING INC2 citations62
SUNEDISON SEMICONDUCTOR LTD UEN201334164H
3 patentsUS10483152B2Nov 19, 2019
High resistivity semiconductor-on-insulator wafer and a method of manufacturing
SUNEDISON SEMICONDUCTOR LTD UEN201334164H1 citations72
US10290533B2May 14, 2019
Thermally stable charge trapping layer for use in manufacture of semiconductor-on-insulator structures
SUNEDISON SEMICONDUCTOR LTD UEN201334164H6 citations72
US10475694B2Nov 12, 2019
Handle substrate for use in manufacture of semiconductor-on-insulator structure and method of manufacturing thereof
SUNEDISON SEMICONDUCTOR LTD UEN201334164H0 citations51
GLOBALWAFERS CO LTD
2 patentsCHEREKDJIAN SARKO
2 patentsUS8058148B2Nov 15, 2011
Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation
CHEREKDJIAN SARKO2 citations60
US8338269B2Dec 25, 2012
Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation
CHEREKDJIAN SARKO1 citations50