Inventor
HUNTER AARON
US32 patents
⚠️ This page may combine multiple inventors who share the name “HUNTER AARON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
21 patentsUS6151446ANov 21, 2000
Apparatus and method for thermally processing substrates including a processor using multiple detection signals
APPLIED MATERIALS INC443 citations99
US7595208B2Sep 29, 2009
Method of laser annealing using two wavelengths of radiation
APPLIED MATERIALS INC22 citations96
US7279721B2Oct 9, 2007
Dual wavelength thermal flux laser anneal
APPLIED MATERIALS INC46 citations96
US6839507B2Jan 4, 2005
Black reflector plate
APPLIED MATERIALS INC61 citations96
US7112763B2Sep 26, 2006
Method and apparatus for low temperature pyrometry useful for thermally processing silicon wafers
APPLIED MATERIALS INC69 citations94
US6183130B1Feb 6, 2001
Apparatus for substrate temperature measurement using a reflecting cavity and detector
APPLIED MATERIALS INC71 citations94
US6179466B1Jan 30, 2001
Method and apparatus for measuring substrate temperatures
APPLIED MATERIALS INC87 citations94
US7414224B2Aug 19, 2008
Backside rapid thermal processing of patterned wafers
APPLIED MATERIALS INC16 citations92
US7041931B2May 9, 2006
Stepped reflector plate
APPLIED MATERIALS INC24 citations92
US6515261B1Feb 4, 2003
Enhanced lift pin
APPLIED MATERIALS INC26 citations92
US7398693B2Jul 15, 2008
Adaptive control method for rapid thermal processing of a substrate
APPLIED MATERIALS INC19 citations91
US6406179B2Jun 18, 2002
Sensor for measuring a substrate temperature
APPLIED MATERIALS INC35 citations91
US7127367B2Oct 24, 2006
Tailored temperature uniformity
APPLIED MATERIALS INC36 citations90
US7985945B2Jul 26, 2011
Method for reducing stray light in a rapid thermal processing chamber by polarization
APPLIED MATERIALS INC8 citations84
US7933009B2Apr 26, 2011
Method and apparatus for verifying proper substrate positioning
APPLIED MATERIALS INC11 citations84
US8372203B2Feb 12, 2013
Apparatus temperature control and pattern compensation
APPLIED MATERIALS INC9 citations83
US7691204B2Apr 6, 2010
Film formation apparatus and methods including temperature and emissivity/pattern compensation
APPLIED MATERIALS INC13 citations83
US7772134B2Aug 10, 2010
Method of annealing using two wavelengths of continuous wave laser radiation
APPLIED MATERIALS INC7 citations74
US9728471B2Aug 8, 2017
System for non radial temperature control for rotating substrates
APPLIED MATERIALS INC3 citations73
US7813895B2Oct 12, 2010
Methods for plasma matching between different chambers and plasma stability monitoring and control
APPLIED MATERIALS INC7 citations71
US9114479B2Aug 25, 2015
Managing thermal budget in annealing of substrates
APPLIED MATERIALS INC3 citations62
JENNINGS DEAN
4 patentsUS8907247B2Dec 9, 2014
Annealing apparatus using two wavelengths of laser radiation
JENNINGS DEAN3 citations73
US8242407B2Aug 14, 2012
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN5 citations73
US8890024B2Nov 18, 2014
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN0 citations51
US8653408B2Feb 18, 2014
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN0 citations51