P

Inventor

ICHIHARA YUTAKA

JP41 patents
⚠️ This page may combine multiple inventors who share the name “ICHIHARA YUTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIKON CORP

29 patents
US6195213B1Feb 27, 2001

Projection exposure apparatus and method

NIKON CORP143 citations99
US5307207AApr 26, 1994

Illuminating optical apparatus

NIKON CORP148 citations99
US5253110AOct 12, 1993

Illumination optical arrangement

NIKON CORP172 citations99
US4851978AJul 25, 1989

Illumination device using a laser

NIKON CORP154 citations99
US5898501AApr 27, 1999

Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens

NIKON CORP94 citations98
US5071240ADec 10, 1991

Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image

NIKON CORP133 citations98
US6456382B2Sep 24, 2002

Interferometer that measures aspherical surfaces

NIKON CORP69 citations96
US5793473AAug 11, 1998

Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same

NIKON CORP68 citations96
US5289312AFeb 22, 1994

Catadioptric reduction projection optical system

NIKON CORP94 citations96
US5220454AJun 15, 1993

Cata-dioptric reduction projection optical system

NIKON CORP72 citations96
US5563706AOct 8, 1996

Interferometric surface profiler with an alignment optical member

NIKON CORP65 citations94
US6522716B1Feb 18, 2003

Multilayer-film reflective mirrors, extreme UV microlithography apparatus comprising same, and microelectronic-device manufacturing methods utilizing same

NIKON CORP49 citations93
US6362926B1Mar 26, 2002

Projection exposure apparatus and method

NIKON CORP21 citations93
US6108140AAug 22, 2000

Catadioptric reduction projection optical system and method

NIKON CORP19 citations93
US5623473AApr 22, 1997

Method and apparatus for manufacturing a diffraction grating zone plate

NIKON CORP25 citations93
US5076695ADec 31, 1991

Interferometer

NIKON CORP31 citations93
US7843550B2Nov 30, 2010

Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method

NIKON CORP17 citations92
US5774240AJun 30, 1998

Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques

NIKON CORP29 citations92
US5528390AJun 18, 1996

Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques

NIKON CORP22 citations92
US5504596AApr 2, 1996

Exposure method and apparatus using holographic techniques

NIKON CORP29 citations92
US5198837AMar 30, 1993

Laser beam harmonics generator and light exposing device

NIKON CORP21 citations89
US6894763B2May 17, 2005

Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same

NIKON CORP15 citations83
US5712735AJan 27, 1998

Catadioptric reduction projection optical system

NIKON CORP12 citations82
US5844728ADec 1, 1998

Catadioptric reduction projection optical system

NIKON CORP4 citations74
US5251070AOct 5, 1993

Catadioptric reduction projection optical system

NIKON CORP18 citations74
US7868997B2Jan 11, 2011

Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method

NIKON CORP5 citations73
US5446556AAug 29, 1995

Video clock signal generator in an optical scanner in which a mask including a linear scale provides timing for controlling the amplitude of a vibrating mirror

NIKON CORP13 citations73
US6118596ASep 12, 2000

Catadioptric reduction projection optical system and method

NIKON CORP3 citations63
US6963408B2Nov 8, 2005

Method and apparatus for point diffraction interferometry

NIKON CORP5 citations59

NIPPON KOGAKU KK

8 patents

USHIO YOSHIJIRO

2 patents

JTEKT CORP

1 patent

SUGIYAMA YOSHIKAZU

1 patent