Inventor
CHOI DAE-HAN
US19 patents
⚠️ This page may combine multiple inventors who share the name “CHOI DAE-HAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GLOBALFOUNDRIES INC
10 patentsUS8871651B1Oct 28, 2014
Mask formation processing
GLOBALFOUNDRIES INC167 citations94
US9159630B1Oct 13, 2015
Fin field-effect transistor (FinFET) device formed using a single spacer, double hardmask scheme
GLOBALFOUNDRIES INC32 citations93
US9735154B2Aug 15, 2017
Semiconductor structure having gap fill dielectric layer disposed between fins
GLOBALFOUNDRIES INC9 citations83
US9105478B2Aug 11, 2015
Devices and methods of forming fins at tight fin pitches
GLOBALFOUNDRIES INC9 citations83
US8697501B1Apr 15, 2014
Semiconductor device having a gate formed on a uniform surface and method for forming the same
GLOBALFOUNDRIES INC17 citations83
US8835328B2Sep 16, 2014
Methods for fabricating integrated circuits with improved semiconductor fin structures
GLOBALFOUNDRIES INC6 citations72
US8993445B2Mar 31, 2015
Selective removal of gate structure sidewall(s) to facilitate sidewall spacer protection
GLOBALFOUNDRIES INC5 citations71
US8969205B2Mar 3, 2015
Double patterning via triangular shaped sidewall spacers
GLOBALFOUNDRIES INC2 citations62
US9196499B2Nov 24, 2015
Method of forming semiconductor fins
GLOBALFOUNDRIES INC3 citations61
US9034767B1May 19, 2015
Facilitating mask pattern formation
GLOBALFOUNDRIES INC0 citations51
LAM RES CORP
3 patentsUS7695632B2Apr 13, 2010
Critical dimension reduction and roughness control
LAM RES CORP14 citations92
US8357434B1Jan 22, 2013
Apparatus for the deposition of a conformal film on a substrate and methods therefor
LAM RES CORP3 citations62
US9384979B2Jul 5, 2016
Apparatus for the deposition of a conformal film on a substrate and methods therefor
LAM RES CORP0 citations51