Inventor

SADJADI S M REZA

US70 patents

⚠️ This page may combine multiple inventors who share the name “SADJADI S M REZA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SADJADI S M REZA

LAM RES CORP

Treatment for corrosion in substrate processing

Reduction of feature critical dimensions using multiple masks

Plasma processing system control

Method of plasma etching of silicon carbide

Multiple mask process with etch mask stack

Stabilized photoresist structure for etching process

Critical dimension reduction and roughness control

Self-aligned pitch reduction

De-fluoridation process

Multiple frequency plasma processor method and apparatus

Reduction of feature critical dimensions

Etching a metal hard mask for an integrated circuit structure

Trench etch process for low-k dielectrics

Method of plasma etching silicon nitride

Etch features with reduced line edge roughness

Plasma in-situ treatment of chemically amplified resist

Etching a dielectric layer in an integrated circuit structure having a metal hard mask layer

Fast gas switching plasma processing apparatus

Infinitely selective photoresist mask etch

Sidewall forming processes

Reduction of feature critical dimensions

Plasma etching of silicon carbide

Mask trimming

Method for patterning multilevel interconnects

Trench etch process for low-k dielectrics

Reticle alignment and overlay for multiple reticle process

Plasma in-situ treatment of chemically amplified resist

Method for etching silicon carbide

Mask trimming with ARL etch

Fin structure formation

Vertical profile fixing

Method of aligning a reticle for formation of semiconductor devices

Etch with striation control

Pitch reduction

Method of forming dual damascene structure

Protective layer for implant photoresist

Apparatus for the deposition of a conformal film on a substrate and methods therefor

NAT SEMICONDUCTOR CORP

Apparatus and method for calibration of patterned wafer scanners

Controllable isotropic plasma etching technique for the suppression of stringers in memory cells

Controllable isotropic plasma etching technique for the suppression of stringers in memory cells

Technique for making memory cells in a way which suppresses electrically conductive stringers

APPLIED MATERIALS INC

Methods and apparatus for controlling substrate uniformity

Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors

Methods and apparatus for controlling substrate uniformity

INTEL CORP

Contact and via fabrication technologies

Contact and via fabrication technologies

ROMANO ANDREW R

Photoresist double patterning

LEE SANGHEON

Critical dimension reduction and roughness control

HEO DONGHO

De-fluoridation process

SADJADI S M REZA

Spacer formation for array double patterning