Inventor

PASQUALE FRANK L

US22 patents

⚠️ This page may combine multiple inventors who share the name “PASQUALE FRANK L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PASQUALE FRANK L

LAM RES CORP

Plasma assisted atomic layer deposition of multi-layer films for patterning applications

Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications

Plasma assisted atomic layer deposition metal oxide for patterning applications

Plasma assisted atomic layer deposition titanium oxide for patterning applications

Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications

Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors

Wafer centering in pocket to improve azimuthal thickness uniformity at wafer edge

Selective atomic layer deposition with post-dose treatment

Low volume showerhead with porous baffle

Selective atomic layer deposition with post-dose treatment

Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system

Fill on demand ampoule refill

Temporally pulsed and kinetically modulated CVD dielectrics for gapfill applications

Composite dielectric interface layers for interconnect structures

Composite dielectric interface layers for interconnect structures

Method for RF compensation in plasma assisted atomic layer deposition

Hardware and process for film uniformity improvement

Hardware and process for film uniformity improvement

Systems and methods for tilting a wafer for achieving deposition uniformity

NOVELLUS SYSTEMS INC

Soft landing nanolaminates for advanced patterning

Soft landing nanolaminates for advanced patterning

Soft landing nanolaminates for advanced patterning