Inventor

TE SLIGTE EDWIN

NL7 patents

⚠️ This page may combine multiple inventors who share the name “TE SLIGTE EDWIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZEISS CARL SMT GMBH

4 patents

US10073361B2Sep 11, 2018

EUV lithography system and operating method

ZEISS CARL SMT GMBH5 citations65

US11199363B2Dec 14, 2021

Method for removing a contamination layer by an atomic layer etching process

ZEISS CARL SMT GMBH1 citations57

US10690812B2Jun 23, 2020

Optical element and optical system for EUV lithography, and method for treating such an optical element

ZEISS CARL SMT GMBH1 citations55

US8980009B2Mar 17, 2015

Method for removing a contamination layer from an optical surface and arrangement therefor

ZEISS CARL SMT GMBH0 citations49

ASML HOLDING NV

1 patent

US12332570B2Jun 17, 2025

Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

ASML HOLDING NV0 citations54

ASML NETHERLANDS BV

1 patent

US11048180B2Jun 29, 2021

Component for use in a patterning device environment

ASML NETHERLANDS BV0 citations47

BLOM PAULUS PETRUS MARIA

1 patent

US9161427B2Oct 13, 2015

Device and method for generating a plasma discharge for patterning the surface of a substrate

BLOM PAULUS PETRUS MARIA0 citations30