Inventor

NISHITA TOKIO

JP22 patents

⚠️ This page may combine multiple inventors who share the name “NISHITA TOKIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NISHITA TOKIO

NISSAN CHEMICAL CORP

Resist underlayer film-forming composition

Protective film-forming composition containing diol structure

Resist underlayer film-forming composition comprising polymer having structural unit having urea linkage

Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer

Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer

Protective film-forming composition having acetal structure and amide structure

Chemical solution-resistant protective film forming composition containing polymerization product having diol structure at terminal thereof

Composition for forming coating film and method for manufacturing semiconductor device

Chemical-resistant protective film-forming composition containing polymerization product of arylene compound having glycidyl group

Aqueous solution for resist pattern coating and pattern forming methods using the same

Chemical-resistant protective film

Composition for forming release layer, and release layer

NISSAN CHEMICAL IND LTD

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same

Resist underlayer film-forming composition and method for forming resist pattern using the same

Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group

Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure

Resist underlayer film formation composition and method for forming resist pattern using the same

Composition for forming antistatic film and oligomer compound

Coating solution for resist pattern coating and method for forming pattern

Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure

Coating liquid for resist pattern coating

Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound