Inventor

FUJITANI NORIAKI

JP17 patents

⚠️ This page may combine multiple inventors who share the name “FUJITANI NORIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJITANI NORIAKI

NISSAN CHEMICAL IND LTD

Composition for forming highly adhesive resist underlayer film

Resist underlayer film-forming composition and method for forming resist pattern using the same

Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same

Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group

Resist underlayer film-forming composition

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same

Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition

Resist underlayer film-forming composition

Resist overlayer film forming composition and method for producing semiconductor device including the same

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same

Resist underlayer film formation composition and method for forming resist pattern using the same

Coating liquid for resist pattern coating

SAKAMOTO RIKIMARU

Resist underlayer film forming composition, and method for forming resist pattern using the same

Resist underlayer film-forming composition for EUV lithography containing condensation polymer

MITSUBISHI PETROCHEMICAL CO

Water penetration preventive cable

NISSAN CHEMICAL CORP

Wafer treatment method

HORIGUCHI YUSUKE

Composition for forming photosensitive resist underlayer film