Inventor
INGLE NITIN
US44 patents
⚠️ This page may combine multiple inventors who share the name “INGLE NITIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
34 patentsUS9842744B2Dec 12, 2017
Methods for etch of SiN films
APPLIED MATERIALS INC113 citations99
US9343327B2May 17, 2016
Methods for etch of sin films
APPLIED MATERIALS INC147 citations99
US9012302B2Apr 21, 2015
Intrench profile
APPLIED MATERIALS INC179 citations99
US8927390B2Jan 6, 2015
Intrench profile
APPLIED MATERIALS INC180 citations99
US10062579B2Aug 28, 2018
Selective SiN lateral recess
APPLIED MATERIALS INC95 citations98
US10049891B1Aug 14, 2018
Selective in situ cobalt residue removal
APPLIED MATERIALS INC101 citations98
US10043674B1Aug 7, 2018
Germanium etching systems and methods
APPLIED MATERIALS INC102 citations97
US6793733B2Sep 21, 2004
Gas distribution showerhead
APPLIED MATERIALS INC145 citations97
US10026621B2Jul 17, 2018
SiN spacer profile patterning
APPLIED MATERIALS INC93 citations96
US10043684B1Aug 7, 2018
Self-limiting atomic thermal etching systems and methods
APPLIED MATERIALS INC96 citations95
US6843882B2Jan 18, 2005
Gas flow control in a wafer processing system having multiple chambers for performing same process
APPLIED MATERIALS INC47 citations90
US10319603B2Jun 11, 2019
Selective SiN lateral recess
APPLIED MATERIALS INC12 citations84
US10468267B2Nov 5, 2019
Water-free etching methods
APPLIED MATERIALS INC2 citations73
US10403507B2Sep 3, 2019
Shaped etch profile with oxidation
APPLIED MATERIALS INC2 citations73
US10256112B1Apr 9, 2019
Selective tungsten removal
APPLIED MATERIALS INC4 citations73
US10163696B2Dec 25, 2018
Selective cobalt removal for bottom up gapfill
APPLIED MATERIALS INC2 citations73
US10128086B1Nov 13, 2018
Silicon pretreatment for nitride removal
APPLIED MATERIALS INC3 citations73
US8986557B2Mar 24, 2015
HDD patterning using flowable CVD film
APPLIED MATERIALS INC4 citations72
US10854426B2Dec 1, 2020
Metal recess for semiconductor structures
APPLIED MATERIALS INC2 citations70
US11328909B2May 10, 2022
Chamber conditioning and removal processes
APPLIED MATERIALS INC1 citations62
US10872778B2Dec 22, 2020
Systems and methods utilizing solid-phase etchants
APPLIED MATERIALS INC1 citations62
US10573527B2Feb 25, 2020
Gas-phase selective etching systems and methods
APPLIED MATERIALS INC1 citations62
US10600639B2Mar 24, 2020
SiN spacer profile patterning
APPLIED MATERIALS INC1 citations61
US12142534B2Nov 12, 2024
Replacement contact process
APPLIED MATERIALS INC0 citations60
US10943834B2Mar 9, 2021
Replacement contact process
APPLIED MATERIALS INC0 citations60
US10861676B2Dec 8, 2020
Metal recess for semiconductor structures
APPLIED MATERIALS INC1 citations59
US10770346B2Sep 8, 2020
Selective cobalt removal for bottom up gapfill
APPLIED MATERIALS INC0 citations52
US10755941B2Aug 25, 2020
Self-limiting selective etching systems and methods
APPLIED MATERIALS INC0 citations52
US10497579B2Dec 3, 2019
Water-free etching methods
APPLIED MATERIALS INC0 citations52
US8043933B2Oct 25, 2011
Integration sequences with top surface profile modification
APPLIED MATERIALS INC1 citations52
US11437242B2Sep 6, 2022
Selective removal of silicon-containing materials
APPLIED MATERIALS INC0 citations51
US10593553B2Mar 17, 2020
Germanium etching systems and methods
APPLIED MATERIALS INC0 citations51
US10497573B2Dec 3, 2019
Selective atomic layer etching of semiconductor materials
APPLIED MATERIALS INC0 citations51
US10566206B2Feb 18, 2020
Systems and methods for anisotropic material breakthrough
APPLIED MATERIALS INC0 citations40