Inventor

LONG MAOLIN

US70 patents

⚠️ This page may combine multiple inventors who share the name “LONG MAOLIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LONG MAOLIN

LAM RES CORP

Systems and methods for reverse pulsing

Systems and methods for reverse pulsing

Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambers

Matchless plasma source for semiconductor wafer fabrication

TCCT match circuit for plasma etch chambers

Matchless plasma source for semiconductor wafer fabrication

Matchless plasma source for semiconductor wafer fabrication

Matchless plasma source for semiconductor wafer fabrication

Direct drive RF circuit for substrate processing systems

RF voltage sensor incorporating multiple voltage dividers for detecting RF voltages at a pickup device of a substrate support

Direct drive RF circuit for substrate processing systems

Large dynamic range RF voltage sensor and method for voltage mode RF bias application of plasma processing systems

RF reference measuring circuit for a direct drive system supplying power to generate plasma in a substrate processing system

RF pulsing within pulsing for semiconductor RF plasma processing

RF pulsing within pulsing for semiconductor RF plasma processing

Radiofrequency (RF) filter for multi-frequency RF bias

Frequency tuning for a matchless plasma source

Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network

TCCT match circuit for plasma etch chambers

Hammerhead TCP coil support for high RF power conductor etch systems

Systems and methods for multi-level pulsing in RF plasma tools

Cathode RF asymmetry detection probe for semiconductor RF plasma processing equipment

Matchless plasma source for semiconductor wafer fabrication

Matchless plasma source for semiconductor wafer fabrication

Matchless plasma source for semiconductor wafer fabrication

Matchless plasma source for semiconductor wafer fabrication

Systems and methods for reverse pulsing

RF pulsing within pulsing for semiconductor RF plasma processing

Protection system for switches in direct drive circuits of substrate processing systems

Matchless plasma source for semiconductor wafer fabrication

Dual-frequency, direct-drive inductively coupled plasma source

Systems for reverse pulsing

Direct frequency tuning for matchless plasma source in substrate processing systems

MATTSON TECH INC

Cooled shield for ICP source

Dual frequency matching circuit for inductively coupled plasma (ICP) loads

Dual frequency matching circuit for inductively coupled plasma (ICP) loads

Configurable faraday shield

Electrostatic chuck assembly for plasma processing apparatus

TOKYO ELECTRON LTD

Gas temperature control for a plasma process

Adjustable segmented electrode apparatus and method

Gas temperature control for a plasma process

Measuring plasma uniformity in-situ at wafer level

LONG MAOLIN

Powered grid for plasma chamber

Faraday shield having plasma density decoupling structure between TCP coil zones

Current control in plasma processing systems

BEIJING E TOWN SEMICONDUCTOR TECH CO LTD

Hybrid plasma source array

Electrostatic chuck assembly for plasma processing apparatus

APPLIED MATERIALS INC

Side RF coil and side heater for plasma processing apparatus

HUAWEI TECH CO LTD

Base-band digital pre-distortion-based method for improving efficiency of RF power amplifier

DREWERY JOHN

Internal Faraday shield having distributed chevron patterns and correlated positioning relative to external inner and outer TCP coil