Inventor
KUBO KENICHI
JP30 patents
⚠️ This page may combine multiple inventors who share the name “KUBO KENICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEXEL CORP
10 patentsUS5115783AMay 26, 1992
Method for varying the flow rate of fuel in a distributor-type electronic control fuel-injection pump
ZEXEL CORP23 citations89
US5513965AMay 7, 1996
Distributor-type fuel injection pump
ZEXEL CORP10 citations74
US5619971AApr 15, 1997
Distributor-type fuel injection pump
ZEXEL CORP11 citations70
US5806493ASep 15, 1998
Distributor type fuel injection pump
ZEXEL CORP7 citations69
US5889733AMar 30, 1999
Timer device for distributor type fuel injection apparatus
ZEXEL CORP2 citations63
US5746584AMay 5, 1998
Inner cam type fuel injection pump having modified plungers
ZEXEL CORP6 citations60
US5641274AJun 24, 1997
Two stage fuel injection pump with second stage located in the first stage inlet line
ZEXEL CORP6 citations57
US5165851ANov 24, 1992
Fuel injection pump
ZEXEL CORP1 citations51
US5857444AJan 12, 1999
Inner cam system distributor type fuel injector
ZEXEL CORP1 citations49
US5915360AJun 29, 1999
Spill control apparatus for fuel injection system
ZEXEL CORP0 citations37
CANON KK
7 patentsUS7899314B2Mar 1, 2011
Photographing system
CANON KK6 citations74
US6370332B1Apr 9, 2002
Zoom lens apparatus
CANON KK11 citations74
US6822686B1Nov 23, 2004
Lens control apparatus
CANON KK10 citations71
US7613387B2Nov 3, 2009
Photographing system
CANON KK2 citations63
US6337952B1Jan 8, 2002
Lens apparatus
CANON KK4 citations63
US6268967B1Jul 31, 2001
Zoom lens apparatus
CANON KK6 citations63
US7043155B2May 9, 2006
Control apparatus for optical apparatus
CANON KK1 citations52
TOKYO ELECTRON LTD
4 patentsUS6966936B2Nov 22, 2005
Processing system, evacuating system for processing system, low-pressure CVD system, and evacuating system and trapping device for low-pressure CVD system
TOKYO ELECTRON LTD69 citations97
US6548112B1Apr 15, 2003
Apparatus and method for delivery of precursor vapor from low vapor pressure liquid sources to a CVD chamber
TOKYO ELECTRON LTD76 citations97
US5334302AAug 2, 1994
Magnetron sputtering apparatus and sputtering gun for use in the same
TOKYO ELECTRON LTD119 citations97
US7476619B2Jan 13, 2009
Semiconductor device
TOKYO ELECTRON LTD1 citations47