Inventor
ARIMOTO YOSHIHIRO
JP16 patents
⚠️ This page may combine multiple inventors who share the name “ARIMOTO YOSHIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
14 patentsUS5624300AApr 29, 1997
Apparatus and method for uniformly polishing a wafer
FUJITSU LTD231 citations98
US5562529AOct 8, 1996
Apparatus and method for uniformly polishing a wafer
FUJITSU LTD119 citations97
US5904609AMay 18, 1999
Polishing apparatus and polishing method
FUJITSU LTD91 citations96
US5413951AMay 9, 1995
Composite semiconductor substrate and a fabrication process thereof
FUJITSU LTD73 citations95
US5037774AAug 6, 1991
Process for the production of semiconductor devices utilizing multi-step deposition and recrystallization of amorphous silicon
FUJITSU LTD55 citations95
US5621239AApr 15, 1997
SOI device having a buried layer of reduced resistivity
FUJITSU LTD49 citations91
US5399233AMar 21, 1995
Method of and apparatus for manufacturing a semiconductor substrate
FUJITSU LTD35 citations87
US7465980B2Dec 16, 2008
Ferroelectric memory, multivalent data recording method and multivalent data reading method
FUJITSU LTD16 citations82
US5506433AApr 9, 1996
Composite semiconductor substrate having a single crystal substrate and a single crystal layer formed thereon
FUJITSU LTD17 citations81
US6114247ASep 5, 2000
Polishing cloth for use in a CMP process and a surface treatment thereof
FUJITSU LTD11 citations73
US5877089AMar 2, 1999
Slurry containing manganese oxide
FUJITSU LTD9 citations73
US5763325AJun 9, 1998
Fabrication process of a semiconductor device using a slurry containing manganese oxide
FUJITSU LTD13 citations73
US6159858ADec 12, 2000
Slurry containing manganese oxide and a fabrication process of a semiconductor device using such a slurry
FUJITSU LTD7 citations72
US7674634B2Mar 9, 2010
Method of producing semiconductor device
FUJITSU LTD2 citations62