Inventor
OGAWA YOSHIFUMI
JP31 patents
⚠️ This page may combine multiple inventors who share the name “OGAWA YOSHIFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
20 patentsUS5685684ANov 11, 1997
Vacuum processing system
HITACHI LTD112 citations98
US6048434AApr 11, 2000
Substrate holding system including an electrostatic chuck
HITACHI LTD68 citations96
US5906684AMay 25, 1999
Method of holding substrate and substrate holding system
HITACHI LTD54 citations96
US5792304AAug 11, 1998
Method of holding substrate and substrate holding system
HITACHI LTD62 citations96
US4609426ASep 2, 1986
Method and apparatus for monitoring etching
HITACHI LTD63 citations94
US5646489AJul 8, 1997
Plasma generator with mode restricting means
HITACHI LTD43 citations93
US5433789AJul 18, 1995
Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves
HITACHI LTD22 citations93
US6645871B2Nov 11, 2003
Method of holding substrate and substrate holding system
HITACHI LTD20 citations92
US6524428B2Feb 25, 2003
Method of holding substrate and substrate holding system
HITACHI LTD24 citations92
US6336991B1Jan 8, 2002
Method of holding substrate and substrate holding system
HITACHI LTD19 citations92
US6221201B1Apr 24, 2001
Method of holding substrate and substrate holding system
HITACHI LTD18 citations92
US5985035ANov 16, 1999
Method of holding substrate and substrate holding system
HITACHI LTD17 citations92
US5961774AOct 5, 1999
Method of holding substrate and substrate holding system
HITACHI LTD22 citations92
US4559100ADec 17, 1985
Microwave plasma etching apparatus
HITACHI LTD43 citations92
US6899789B2May 31, 2005
Method of holding substrate and substrate holding system
HITACHI LTD11 citations82
US6676805B2Jan 13, 2004
Method of holding substrate and substrate holding system
HITACHI LTD10 citations82
US6610170B2Aug 26, 2003
Method of holding substrate and substrate holding system
HITACHI LTD8 citations74
US6610171B2Aug 26, 2003
Method of holding substrate and substrate holding system
HITACHI LTD6 citations74
US6544379B2Apr 8, 2003
Method of holding substrate and substrate holding system
HITACHI LTD9 citations74
US4664767AMay 12, 1987
Plasma treating method and apparatus therefor
HITACHI LTD8 citations69
HITACHI HIGH TECH CORP
5 patentsUSD924824SJul 13, 2021
Ion shield plate base for semiconductor manufacturing apparatus
HITACHI HIGH TECH CORP10 citations84
US10121686B2Nov 6, 2018
Vacuum processing apparatus
HITACHI HIGH TECH CORP7 citations82
US12449825B2Oct 21, 2025
Gas supply control device
HITACHI HIGH TECH CORP2 citations74
US11835465B2Dec 5, 2023
Detecting method and detecting device of gas components and processing apparatus using detecting device of gas components
HITACHI HIGH TECH CORP0 citations52
US12442455B2Oct 14, 2025
Gas supply apparatus, vacuum processing apparatus, and gas supply method
HITACHI HIGH TECH CORP0 citations48
TOSHIBA KK
4 patentsUS5821622AOct 13, 1998
Liquid crystal display device
TOSHIBA KK132 citations97
US5296653AMar 22, 1994
Device having a multi-layered conductor structure
TOSHIBA KK54 citations94
US5738948AApr 14, 1998
Electrode-wiring material and electrode-wiring substrate using the same
TOSHIBA KK33 citations91
US5212094AMay 18, 1993
Automatic chemical analyzer
TOSHIBA KK19 citations82