Inventor
NEI MASAHIRO
JP23 patents
⚠️ This page may combine multiple inventors who share the name “NEI MASAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
17 patentsUS7589820B2Sep 15, 2009
Exposure apparatus and method for producing device
NIKON CORP49 citations96
US6549271B2Apr 15, 2003
Exposure apparatus and method
NIKON CORP58 citations96
US6342941B1Jan 29, 2002
Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and method
NIKON CORP62 citations96
US5864386AJan 26, 1999
Exposure apparatus
NIKON CORP68 citations96
US5329336AJul 12, 1994
Exposure method and apparatus
NIKON CORP57 citations95
US7242455B2Jul 10, 2007
Exposure apparatus and method for producing device
NIKON CORP32 citations92
US5872618AFeb 16, 1999
Projection exposure apparatus
NIKON CORP22 citations92
US6813004B1Nov 2, 2004
Exposure method, exposure apparatus and making method of the apparatus, and device and manufacturing method of the device
NIKON CORP37 citations90
US6492649B1Dec 10, 2002
Projection exposure apparatus, projection exposure method, optical cleaning method and method of fabricating semiconductor device
NIKON CORP18 citations83
US11854288B2Dec 26, 2023
Image determining device to determine the state of a subject
NIKON CORP1 citations72
US7834976B2Nov 16, 2010
Exposure apparatus and method for producing device
NIKON CORP2 citations63
US7817244B2Oct 19, 2010
Exposure apparatus and method for producing device
NIKON CORP2 citations63
US9019467B2Apr 28, 2015
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP2 citations62
US11055522B2Jul 6, 2021
Image determining device to determine the state of a subject
NIKON CORP0 citations61
US9268237B2Feb 23, 2016
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP0 citations52
US8384880B2Feb 26, 2013
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP0 citations52
US10275645B2Apr 30, 2019
Image determining device to determine the state of a subject
NIKON CORP0 citations51