Inventor

WIRBELEIT FRANK

DE25 patents

⚠️ This page may combine multiple inventors who share the name “WIRBELEIT FRANK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WIRBELEIT FRANK

ADVANCED MICRO DEVICES INC

Stressed MOS device and method for its fabrication

Self-biasing transistor structure and an SRAM cell having less than six transistors

Technique for transferring strain into a semiconductor region

Method for fabricating a semiconductor device

Method of making a semiconductor device comprising isolation trenches inducing different types of strain

Methods for fabrication of a stressed MOS device

Formation of transistor having a strained channel region including a performance enhancing material composition utilizing a mask pattern

Stressed MOS device

Semiconductor device having nanowire contact structures and method for its fabrication

GLOBALFOUNDRIES INC

Body controlled double channel transistor and circuits comprising the same

Reduction of memory instability by local adaptation of re-crystallization conditions in a cache area of a semiconductor device

Method of forming a semiconductor structure comprising a formation of at least one sidewall spacer structure

Method of forming a semiconductor structure

Method for selectively forming strain in a transistor by a stress memorization technique without adding additional lithography steps

Method for forming a strained transistor by stress memorization based on a stressed implantation mask

Inline stress evaluation in microstructure devices

WIRBELEIT FRANK

Static RAM cell design and multi-contact regime for connecting double channel transistors

Transistor with embedded strain-inducing material formed in diamond-shaped cavities based on a pre-amorphization

Three-dimensional transistor with double channel configuration

Method for forming a strained transistor by stress memorization based on a stressed implantation mask

Body controlled double channel transistor and circuits comprising the same

Static RAM cell design and multi-contact regime for connecting double channel transistors

SCHWAN CHRISTOPH

Semiconductor device comprising isolation trenches inducing different types of strain

FLACHOWSKY STEFAN

Fabrication of a semiconductor device with extended epitaxial semiconductor regions

WIATR MACIEJ

Method for differential spacer removal by wet chemical etch process and device with differential spacer structure