Inventor
MIYAGI TADASHI
JP29 patents
⚠️ This page may combine multiple inventors who share the name “MIYAGI TADASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SCREEN HOLDINGS CO LTD
6 patentsUS11400480B2Aug 2, 2022
Substrate processing apparatus and substrate processing method
SCREEN HOLDINGS CO LTD0 citations59
US10684548B2Jun 16, 2020
Developing method
SCREEN HOLDINGS CO LTD0 citations52
US10185219B2Jan 22, 2019
Developing method
SCREEN HOLDINGS CO LTD0 citations52
US9972516B2May 15, 2018
Exposure device, substrate processing apparatus, exposure method for substrate and substrate processing method
SCREEN HOLDINGS CO LTD1 citations51
US10236200B2Mar 19, 2019
Exposure device and substrate processing apparatus
SCREEN HOLDINGS CO LTD0 citations41
US10042262B2Aug 7, 2018
Negative developing method and negative developing apparatus
SCREEN HOLDINGS CO LTD0 citations41
SOKUDO CO LTD
5 patentsUS7497633B2Mar 3, 2009
Substrate processing apparatus and substrate processing method
SOKUDO CO LTD42 citations92
US8034190B2Oct 11, 2011
Substrate processing apparatus and substrate processing method
SOKUDO CO LTD22 citations91
US7604424B2Oct 20, 2009
Substrate processing apparatus
SOKUDO CO LTD29 citations90
US8040488B2Oct 18, 2011
Substrate processing apparatus
SOKUDO CO LTD3 citations61
US9063429B2Jun 23, 2015
Negative developing method and negative developing apparatus
SOKUDO CO LTD0 citations38
MIYAGI TADASHI
4 patentsUS9028621B2May 12, 2015
Substrate cleaning method and substrate cleaning device
MIYAGI TADASHI5 citations66
US8894775B2Nov 25, 2014
Substrate processing apparatus and substrate processing method
MIYAGI TADASHI3 citations61
US8218124B2Jul 10, 2012
Substrate processing apparatus with multi-speed drying having rinse liquid supplier that moves from center of rotated substrate to its periphery and stops temporarily so that a drying core can form
MIYAGI TADASHI2 citations61
US10134610B2Nov 20, 2018
Substrate processing method for drying a substrate by discharging gas to liquid layer on the substrate while rotating the substrate
MIYAGI TADASHI0 citations40
MITSUBISHI ELECTRIC CORP
3 patentsUS6180320B1Jan 30, 2001
Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby
MITSUBISHI ELECTRIC CORP70 citations95
US6217319B1Apr 17, 2001
Semiconductor manufacturing device and method of processing wafer
MITSUBISHI ELECTRIC CORP2 citations63
US6514122B2Feb 4, 2003
System for manufacturing semiconductor device utilizing photolithography technique
MITSUBISHI ELECTRIC CORP5 citations60
KANEYAMA KOJI
3 patentsSCREEN SEMICONDUCTOR SOLUTIONS CO LTD
3 patentsUS10047441B2Aug 14, 2018
Substrate processing apparatus and substrate processing method
SCREEN SEMICONDUCTOR SOLUTIONS CO LTD1 citations62
US9828676B2Nov 28, 2017
Substrate processing apparatus and substrate processing method
SCREEN SEMICONDUCTOR SOLUTIONS CO LTD0 citations51
US9477162B2Oct 25, 2016
Substrate processing method
SCREEN SEMICONDUCTOR SOLUTIONS CO LTD0 citations51