Inventor

ANWAR SUHAIL

US53 patents

⚠️ This page may combine multiple inventors who share the name “ANWAR SUHAIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ANWAR SUHAIL

APPLIED MATERIALS INC

Multiple slot load lock chamber and method of operation

Apparatus and method of forming an indium gallium zinc oxide layer

Detection and suppression of electrical arcing

Detection and suppression of electrical arcing

Decoupled chamber body

Substrate support

Plasma uniformity control by gas diffuser hole design

Substrate support

Load lock chamber with heater in tube

Plasma uniformity control by gas diffuser hole design

Substrate support bushing

CVD thin film stress control method for display application

Transmission line RF applicator for plasma chamber

Substrate processing method and apparatus for controlling phase angles of harmonic signals

Slit valve door with moving mating part

Substrate support with ceramic insulation

Susceptor with heater

Susceptor with heater

High density plasma enhanced process chamber

Shadow frame support

Method of avoiding haze formation on surfaces of silicon-containing PECVD-deposited thin films

Systems and methods for improved radio frequency matching networks

Apparatus and methods for a fixed impedance transformation network for use in connection with a plasma chamber

Shadow frame with sides having a varied profile for improved deposition uniformity

Tightly fitted ceramic insulator on large area electrode

Electronic device manufacturing component with an embedded chip and methods of using the same

Compact configurable modular radio frequency matching network assembly for plasma processing systems

Large-area high-density plasma processing chamber for flat panel displays

KURITA SHINICHI

Scissor lift transfer robot

Substrate support bushing

Multiple slot load lock chamber and method of operation

Vertical inline CVD system

Substrate transfer robot with chamber and substrate monitoring capability

Vertical inline CVD system

KUDELA JOZEF

Guided wave applicator with non-gaseous dielectric for plasma chamber

Tightly fitted ceramic insulator on large area electrode

Transmission line RF applicator for plasma chamber

Plasma source with vertical gradient

CHOI SOO YOUNG

Plasma uniformity control by gas diffuser hole design

Ground return for plasma processes

Plasma uniformity control by gas diffuser hole design

Anodized showerhead

BEHDJAT MEHRAN

Load lock chamber for large area substrate processing system

Slit valve door able to compensate for chamber deflection

ANWAR SUHAIL

Gas flow diffuser faceplate

Flow blocking shadow frame support

SORENSEN CARL A

RF bus and RF return bus for plasma chamber electrode

LEE JAE-CHULL

Load lock chamber with decoupled slit valve door seal compartment

FURUTA GAKU

Susceptor with heater

WON TAE KYUNG

Thin film deposition using microwave plasma