Inventor

FURUTA GAKU

US32 patents

⚠️ This page may combine multiple inventors who share the name “FURUTA GAKU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FURUTA GAKU

APPLIED MATERIALS INC

Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors

Asymmetric grounding of rectangular susceptor

Repeatability of CVD film deposition during sequential processing of substrates in a deposition chamber

Substrate support with quadrants

Susceptor with insulative inserts

Run-to-run stability of film deposition

Substrate support with quadrants

Substrate support with ceramic insulation

Susceptor with heater

Susceptor with heater

Differential etch rate control of layers deposited by chemical vapor deposition

Method of removal of sharp corners from diffuser plate

Corner spoiler for improving profile uniformity

Chamber liner

Shadow frame with sides having a varied profile for improved deposition uniformity

Tightly fitted ceramic insulator on large area electrode

A-Si seasoning effect to improve SiN run-to-run uniformity

Low temperature multilayer dielectric film for passivation and capacitor

Deposition chamber system diffuser with increased power efficiency

FURUTA GAKU

Plasma processing including asymmetrically grounding a susceptor

Susceptor with heater

a-Si seasoning effect to improve SiN run-to-run uniformity

Thin film transistors having multiple doped silicon layers

Susceptor with roll-formed surface and method for making same

CHOI SOO YOUNG

Ground return for plasma processes

Anodized showerhead

ANWAR SUHAIL

Gas flow diffuser faceplate

Flow blocking shadow frame support

SHARP LAB OF AMERICA INC

System and method for etching adjoining layers of silicon and indium tin oxide

KUDELA JOZEF

Tightly fitted ceramic insulator on large area electrode

TINER ROBIN L

RF shutter

WANG QUNHUA

Flip edge shadow frame