Inventor
HAGIWARA HIDEO
JP27 patents
⚠️ This page may combine multiple inventors who share the name “HAGIWARA HIDEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEMICAL CO LTD
17 patentsUS5472823ADec 5, 1995
Photosensitive resin composition
HITACHI CHEMICAL CO LTD30 citations92
US6071667AJun 6, 2000
Photosensitive resin composition containing a photosensitive polyamide resin
HITACHI CHEMICAL CO LTD17 citations91
US5811218ASep 22, 1998
Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same
HITACHI CHEMICAL CO LTD17 citations83
US5268485ADec 7, 1993
Naphthalocyanine derivatives, production thereof and optical recording medium using the same
HITACHI CHEMICAL CO LTD18 citations82
US5856059AJan 5, 1999
Photosensitive resin composition
HITACHI CHEMICAL CO LTD16 citations81
US5217856AJun 8, 1993
Tetraazaporphin, process for producing the same, as well as optical recording media using the same and production processes thereof
HITACHI CHEMICAL CO LTD14 citations74
US5075203ADec 24, 1991
Naphthalocyanine derivatives, production thereof and optical recording medium using the same
HITACHI CHEMICAL CO LTD7 citations74
US5034309AJul 23, 1991
Naphthalocyanine derivatives and their use in optical recording medium
HITACHI CHEMICAL CO LTD13 citations74
US5847071ADec 8, 1998
Photosensitive resin composition
HITACHI CHEMICAL CO LTD6 citations73
US5668248ASep 16, 1997
Photosensitive resin composition
HITACHI CHEMICAL CO LTD11 citations73
US5110968AMay 5, 1992
Naphthalocyanine derivatives, production thereof, optical recording medium using the same, and production thereof
HITACHI CHEMICAL CO LTD4 citations63
US5039600AAug 13, 1991
Naphthalocyanine derivatives, production thereof, optical recording medium using the same, and production thereof
HITACHI CHEMICAL CO LTD5 citations63
US6197475B1Mar 6, 2001
Positive type photosensitive resin composition containing an alkali-soluble polymer and a compound which forms an amine compound with irradiation of light
HITACHI CHEMICAL CO LTD2 citations62
US6194126B1Feb 27, 2001
Pattern-forming process using photosensitive resin composition
HITACHI CHEMICAL CO LTD3 citations62
US6309791B1Oct 30, 2001
Polyimide precursor, polyimide and their use
HITACHI CHEMICAL CO LTD3 citations61
US6143475ANov 7, 2000
Polyimide precursor, polyimide and their use
HITACHI CHEMICAL CO LTD1 citations61
US7153631B2Dec 26, 2006
Pattern-forming process using photosensitive resin composition
HITACHI CHEMICAL CO LTD0 citations51